Silicon Dioxide Film with Low Dielectric Constants using Liquid-Phase Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-10-15
著者
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Haneji Nobuo
Division Of Electrical And Computer Engineering Faculty Of Engineering Yokohama National University
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Chanthamaly Phonekeo
Division of Electrical and Computer Engineering, Faculty of Engineering, Yokohama National Universit
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Arakawa Taro
Division of Electrical and Computer Engineering, Faculty of Engineering, Yokohama National Universit
-
Arakawa Taro
Division Of Electrical And Computer Engineering Faculty Of Engineering Yokohama National University
-
Chanthamaly Phonekeo
Division Of Electrical And Computer Engineering Faculty Of Engineering Yokohama National University
-
Haneji Nobuo
Division of Electrical and Computer Engineering, Faculty of Engineering, Yokohama National University
関連論文
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- Preparation of Amorphous Fluorinated Carbon Film Using Low Global-Warming Potential Gas, C4F6, by Plasma Enhanced Chemical Vapor Deposition
- Influence of One Monolayer Thickness Variation in GaAs/AlGaAs Five-Layer Asymmetric Coupled Quantum Well upon Electrorefractive Index Change
- Electrical and Thermal Stability Characteristics of HfCN Films as Metal Gate-Electrode Synthesized by Metalorganic Chemical Vapor Deposition