Improvement of TiN Flow Modulation Chemical Vapor Deposition from TiCl_4 and NH_3 by Introducing Ar Purge Time
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-04-15
著者
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SHIMOGAKI Yukihiro
Department of Materials Engineering, The University of Tokyo
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JUN Keeyoung
Department of Materials Engineering, School of Engineering, University of Tokyo
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Jun Keeyoung
Department Of Materials Engineering School Of Engineering Univ. Of Tokyo
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IM Ik-Tae
Dept. of Automotive Engineering, Iksan National College
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