Sakoda Kaoru | Taiyo-Nippon Sanso Corporation, Tsukuba, Ibaraki 300-2611, Japan
スポンサーリンク
概要
関連著者
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Sakoda Kaoru
Taiyo-Nippon Sanso Corporation, Tsukuba, Ibaraki 300-2611, Japan
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HASAKA Satoshi
TAIYO NIPPON SANSO CORPORATION
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Nagano Shuji
Taiyo Nippon Sanso Corporation, 10 Okubo, Tsukuba, Ibaraki 300-2611, Japan
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Nagano Shuji
Taiyo-Nippon Sanso Corporation, Tsukuba, Ibaraki 300-2611, Japan
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Shimizu Hideharu
Taiyo-Nippon Sanso Corp., Tsukuba, Ibaraki 300-2611, Japan
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Momose Takeshi
Department of Material Engineering, The University of Tokyo, Bunkyo, Tokyo 163-8656, Japan
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Shimizu Hideharu
Taiyo-Nippon Sanso Corporation, Tsukuba, Ibaraki 300-2611, Japan
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Hasaka Satoshi
Taiyo-Nippon Sanso Corporation, Tsukuba, Ibaraki 300-2611, Japan
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Kobayashi Kiyoteru
Tokai University, Hiratsuka, Kanagawa 259-1292, Japan
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Shimogaki Yukihiro
Department of Chemical System Engineering, Faculty of Engineering, University of Tokyo,
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SHIMOGAKI YUKIHIRO
Department of Chemical Engineering, University of Tokyo
著作論文
- Atomic Layer Deposited Co(W) Film as a Single-Layered Barrier/Liner for Next-Generation Cu-Interconnects
- Effectiveness of Dimethyl Carbonate and Dipivaloyl Methane Chemicals for Internal Repair of Plasma-Damaged Low-$k$ Films