Jun Keeyoung | Department Of Materials Engineering School Of Engineering The University Of Tokyo
スポンサーリンク
概要
関連著者
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Jun Keeyoung
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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SHIMOGAKI YUKIHIRO
Department of Chemical Engineering, University of Tokyo
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Shimogaki Yukihiro
Department of Electronic Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113, Japan
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Egashira Yasuyuki
Division Of Chemical Engineering Department Of Chemical Engineering Osaka University
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IM Ik-Tae
Dept. of Automotive Engineering, Iksan National College
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Shimogaki Yukihiro
Department of Materials Engineering, School of Engineering, Univ. of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Shimogaki Yukihiro
Department of Materials Engineering, School of Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Egashira Yasuyuki
Division of Chemical Engineering, Department of Chemical Engineering, Osaka University, 1-3 Machikaneyama-cho, Toyonaka-shi, Osaka 560, Japan
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Jun Keeyoung
Department of Materials Engineering, School of Engineering, Univ. of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Jun Keeyoung
Department of Materials Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Jun Keeyoung
Department of Materials Engineering, School of Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Im Ik-Tae
Dept. of Automotive Engineering, Iksan National College, 194-5 Ma-dong, Iksan 570-752, Korea
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Shimogaki Yukihiro
Department of Chemical System Engineering, Faculty of Engineering, University of Tokyo,
著作論文
- Improvement of TiN Flow Modulation Chemical Vapor Deposition from TiCl4 and NH3 by Introducing Ar Purge Time
- Effect of Partial Pressure of TiCl4 and NH3 on Chemical Vapor Deposition Titanium Nitride (CVD-TiN) Film Cl Content and Electrical Resistivity
- Kinetics of TiN Chemical Vapor Deposition Process using TiCl4 and NH3 for ULSI Diffusion Barrier Applications: Relationship between Step Coverage and NH3 Partial Pressure