Three-Dimensional Simulation of Silicon Melt Flow in Electromagnetic Czochralski Crystal Growth

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2000-02-15

著者

• 渡辺 正裕

  東京工業大学大学院総合理工学研究科

• HIBIYA Taketoshi

  Fundamental Research Laboratories, NEC Corporation

• Watanabe M

  Hiroshima Univ. Higashi‐hiroshima Jpn

• Wang W

  National Laboratory Of Solid State Microstructure And Department Of Physics Nanjing University

• Watanabe Mahiko

  Department Of Applied Physics And Chemistry Faculty Of Engineering Hiroshima University

• Watanabe M

  Nec Corp. Ibaraki Jpn

• Wang W

  National Tainan Teachers Coll. Tainan Twn

• WATANABE Masahito

  Fundamental Research Laboratories, NEC Corporation

• WANG Wei

  Fundamental Research Laboratories, NEC Corporation

• TANAHASHI Takahiko

  Faculty of Science and Technology, Keio University

• Hibiya T

  Fundamental Research Laboratories Nec Corporation

• Tanahashi T

  Faculty Of Science And Technology Keio University

• Tanahashi Takahiko

  Faculty Of Science And Technology Keio University

• Hibiya Taketoshi

  Fundamental Research Laboratories Nec Corporation

• Tanahashi Takahiko

  Faculty Of Engineering Keio University

• Wang Wei

  National Laboratory of Solid State Microstructure and Department of Physics, Nanjing University

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