Change in Velocity in Silicon Melt of the Czochralski (CZ) Process in a Vertical Magnetic Field
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概要
- 論文の詳細を見る
The influence of a magnetic field on the velociry of molten silicon has been characterized both theoretically and experimentally, The velocity decrease observed by X-ray radiography in the magnetic field is in good agreement with the results obtained by numerical modelling. It is found that the rate of decrease in velocity in a vertical magnetic field is well presented using the magnetic number rather than the Hartmann number. Accordingly, the analytical expression using the square of the magnetic number, M, well describes the velociry changes as v/v_0=(1+M^2/4)^<1/2>-M/2, for experimental as well as numerically calculated data.
- 社団法人応用物理学会の論文
- 1994-04-01
著者
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HIBIYA Taketoshi
Fundamental Research Laboratories, NEC Corporation
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Kakimoto Koichi
Institute Of Advanced Material Study Kyushu University
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WATANABE Masahito
Fundamental Research Laboratories, NEC Corporation
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Yi Kyung-woo
School Of Materials Science And Engineering Seoul National University
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Yi Kyung-woo
Fundamental Research Laboratories Nec Corporation
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Hibiya T
Fundamental Research Laboratories Nec Corporation
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Eguchi Minoru
Fundamental Research Laboratories Nec Corporation
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KAKIMOTO Koichi
Fundamental Research Laboratories, NEC Corporation
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Hibiya Taketoshi
Fundamental Research Laboratories Nec Corporation
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