Kinetic Study on Oxidation of Si(111) Surfaces using H_2O
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-04-15
著者
-
TAKAMI Seiichi
Department of Materials Chemistry, Graduate School of Engineering, Tohoku University
-
EGASHIRA Yasuyuki
Department of Chemical Engineering, Osaka University
-
Egashira Yasuyuki
Department Of Chemical Engineering Graduate School Of Engineering Science Osaka University
-
Egashira Yasuyuki
Department Of Chemical System Engineering Faculty Of Engineering The University Of Tokyo
-
Takami Seiichi
Department Of Chemical System Engineering Faculty Of Engineering The University Of Tokyo
-
KOMIYAMA Hiroshi
Department of Chemical System Engineering, The University of Tokyo
-
Komiyama Hiroshi
Department Of Chemical Engineering Faculty Of Engineering University Of Tokyo
-
Komiyama Hiroshi
Department Of Chemical System Engineering Faculty Of Engineering The University Of Tokyo
関連論文
- Adsorption Properties of CH_3OH on Al(111) and Fe(100) Surfaces : A Periodic First-Principles Investigation
- Investigation of Hydrogen Chemisorption on GaAs(111)A Ga Surface by In Situ Monitoring and Ab Initio Calculation
- Quantum Chemical Molecular Dynamics Studies on the Chemical Mechanical Polishing Process of Cu Surface
- A Theoretical Study on the Realistic Low Concentration Doping in Silicon Semiconductors by Accelerated Quantum Chemical Molecular Dynamics Method
- Quantum Chemical Molecular Dynamics Simulation of the Plasma Etching Processes
- Structural Properties of Li_xMn_2O_4 as Investigated by Molecular Dynamics and Density Functional Theory
- Potential Energy Surface and Dynamics of Pd/MgO(001)System as Investigated by Periodic Density Functional Calculations and Classical Molecular Dynamics Simulations
- Basic data of research project on large scale afforestation of arid land for carbon fixation near Leonora in Western Australia (小特集 沙漠工学分科会)
- Development of Integrated Simulator of Water Transport and Plant Growth as an Evaluation Tool of Arid Land Afforestation for CO_2 Fixation
- Comparative Analysis between Biomass and Topographic Features in an Arid Land, Western Australia
- Restructuring and Afforestation of Hardpan Area to Sequester Carbon
- Investigation of Thermal Annealing Process of GaN Layer on Sapphire by Molecular Dynamics
- Investigation of Initial Growth Process of GaN Film on Sapphire Using Computational Chemistry
- Investigation of Growth Process of GaN Film on Sapphire by Computational Chemistry
- Atomistic Crystal Growth Process of Metal Oxide Electronics Materials : Theoretical Simulation Studies
- Quantum Chemical Calculations of Sulfur Doping Reactions in Diamond CVD
- Molecular Orbital Calculations of Sulfur Doping Reactions in Diamond CVD
- Computational Chemistry Study on Initial Stages of Nitridation of Silicon Surfaces
- Molecular Dynamics Simulations of Adhesional Forces via Hydrocarbon Films
- Nonlinear Susceptibility of Second Harmonic Generation Corresponded to the Diamond(100)Surface Structures
- Development of New Tight-Binding Molecular Dynamics Program to Simulate Chemical-Mechanical Polishing Processes
- Development of New Tight-Binding Molecular Dynamics Program to Simulate Chemical-Mechanical Polishing Processes
- Surface Protrusions of Chemical Vapor Deposited TiN Films Caused by Cu Contamination of Silicon Substrates
- Examination of Surface Elementary Reaction Model for Chemical Vapor Deposition of Al Using In Situ Infrared Reflection Absorption Spectroscopy : Teoretical Optimization Procedure (3)
- Elementary Surface Reaction Simulation of Aluminum Chemical Vapor Deposition from Dimethylaluminumhydride Based on Ab Initio Calculations : Theoretical Process Optimization Procedure(2)
- Kinetics of GaAs Metalorganic Chemical Vapor Deposition Studied by Numerical Analysis Based on Experimental Reaction Data
- Reaction Analysis of Aluminum Chemical Vapor Deposition from Dimethyl-aluminum-hydride Using Tubular Reactor and Fourier-Transform Infrared Spectroscopy : Theoretical Process Optimization Procedure(1)
- Computational Chemistry Study on Crystal Growth of InGaN/GaN
- Computational Chemistry Study on Crystal Growth Process of InGaN/GaN
- Formation of Ordered Mesostructured Silica by Vapor Infiltration of Tetraethoxysilane into Hexagonally Arranged Surfactant-Catalyst Nanocomposites
- Ultrathin Silica Films with a Nanoporous Monolayer
- Effect of Underlayers on the Morphology and Orientation of Aluminum Films Prepared by Chemical Vapor Deposition Using Dimethylaluminumhydride
- Molecular Adsorption on Ultrafine Precious Metal Particles Studied by Density Functional Calculation
- Kinetic Study on Oxidation of Si(111) Surfaces using H_2O
- Deposition of wsi_x Films from Preactivated Mixture of WF_6/SiH_4
- Phytoplankton Decomposition Process (PDP) Model Dealing with Carbon and Nitrogen Budget on Particulate Organic Matter
- Decomposition of Phytoplankton in Seawater. Part 1: Kinetic Analysis of the Effect of Organic Matter Concentration
- Characterization of Amorphous Carbon Films Prepared by Photo-Enhanced Chemical Vapor Deposition at Low Temperatures
- Pore Modification of Anodic Alumina Membrane by Position-Controlled CVD Using Catalytic Reaction
- Study on Adsorption and Desorption Mechanisms at the Interface on the Basis of Experimental Data of Bubble Coalescence Time
- Synthesis of Partially Carbonized Polyimide Membranes with High Resistance to Moisture
- Partially Carbonized Polyimide Membranes with High Permeability for Air Separation
- Zirconium-Containing Mesoporous Silica with High Alkaline Resistance
- Decrease in Deposition Rate and Improvement of Step Coverage by CF_4 Addition to Plasma-Enhanced Chemical Vapor Deposition of Silicon Oxide Films
- Preparation of Low-Dielectric-Constant F-Doped SiO2 Films by Plasma-Enhanced Chemical Vapor Deposition
- Preparation of Low Dielectric Constant F-Doped SiO_2 Films by PECVD
- Synthesis of Nanostructured Diamond via Controlled Surface Pretreatment in Hexane Medium
- Molecular Dynamics Studies of Surface Difference Effect on Gas Separation by Zeolite Membranes
- Theoretical Study on Fe-Based Metal Clusters: Application in Heterogeneous Catalysis
- Rapid Growth of AlN Films by Particle-Precipitation Aided Chemical Vapor Deposition
- Gas-Sensitive Optical Absorption of Ultrafine Silver Particles Dispersed in a Porous Silica Film : Surfaces, Interfaces and Films
- Morphology Evolution of SiO_2 Films Deposited by Tetraethylorthosilicate/O_3 Atmospheric-Pressure Chemical Vapor Deposition on Thermal SiO_2
- Step Coverage Analysis for Hexamethyldisiloxane and Ozone Atmospheric Pressure Chemical Vapor Deposition
- Biomass Gasification in Supercritical Water with Partial Oxidation
- TiN Films Prepared by Flow Modulation Chemical Vapor Deposition using TiCl4 and NH3
- Novel Gas Detection Method by Metal-Insulator Conglomerate
- Gas-Sensitive Electrical Conduction and its Mechanism in a Ag/Insulator System with Locally Discontinuous Structure
- Kinetic Study of CVD Reaction by Area-Controlled CVD
- Growth Mechanism of ZnO Film by Reactive Sputtering Method : Significance of Thermodynamics in a Plasma System
- Water Use Efficiency of Eucalyptus camaldulensis Growing in Arid Regions in Western Australia
- $c$-Axis Oriented Face-Centered-Tetragonal-FePt Nanoparticle Monolayer Formed on a Polycrystalline TiN Seed Layer
- Stranski–Krastanov Growth of Tungsten during Chemical Vapor Deposition Revealed by Micro-Auger Electron Spectroscopy
- Ab Initio Calculation of F Atom Desorption in Tungsten Chemical Vapor Deposition Process Using WF6 and H2
- ACTIVATION MECHANISM OF AMORPHOUS NixZr100-x ALLOYS DURING CO/H2 REACTION AND PREPARATION METHOD OF POROUS AMORPHOUS ALLOY CATALYSTS
- Nucleation of W during Chemical Vapor Deposition from WF6 and SiH4
- Quantum Chemical Molecular Dynamics Simulation of the Plasma Etching Processes
- A Theoretical Study on the Realistic Low Concentration Doping in Silicon Semiconductors by Accelerated Quantum Chemical Molecular Dynamics Method
- Quantum Chemical Molecular Dynamics Studies on the Chemical Mechanical Polishing Process of Cu Surface
- Quantum Chemical Calculations of Sulfur Doping Reactions in Diamond CVD
- Simple Kinetic Model of ECR Reactive Ion Beam Etching Reactor for the Optimization of GaAs Etching Process
- Computational Chemistry Study on Crystal Growth of InGaN/GaN
- Hydrogenation of carbon monoxide, aldehydes, and unsaturated hydrocarbons on titania-supported palladium catalysts.
- Development of New Tight-Binding Molecular Dynamics Program to Simulate Chemical-Mechanical Polishing Processes
- Solvent vapor pressure effects in a supported liquid phase catalyst system. Oxidation of ethylene to acetaldehyde.:OXIDATION OF ETHYLENE TO ACETALDEHYDE
- Kinetic Study on Oxidation of Si(111) Surfaces using H 2O