Anisotropic Etching of SiO_2 Film and Quartz Plate Employing Anhydrous HF
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-30
著者
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堀池 靖浩
物質・材料研究機構
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Horiike Yasuhiro
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Horiike Yasuhiro
Department Of Materials Science University Of Tokyo
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Horiike Yasuhiro
Department Of Electrical Engineering Toyo University
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Fukasawa Takayuki
School Of Engineering The University Of Tokyo
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堀池 靖浩
広島大工
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HORIIKE Yasuhiro
School of Engineering, The University of Tokyo
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