Itoh M | Institute Of Applied Physics University Of Tsukuba
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概要
関連著者
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Itoh M
Institute Of Applied Physics University Of Tsukuba
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Itoh M
Institute Of Industrial Science University Of Tokyo
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Itoh M
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Itoh Masahide
Institute Of Applied Physics University Of Tsukuba
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Itoh Masahide
Institute Of Applied Physics And Tsukuba Avuanced Research Alliance University Of Tsukuba
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YATAGAI Toyohiko
Institute of Applied Physics, University of Tsukuba
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Yatagai Toyohiko
Institute For Applied Physics University Of Tsukuba
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Yatagai T
Institute Of Applied Physics University Of Tsukuba
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HUANG Hongxin
Institute of Applied Physics, University of Tsukuba
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Huang Hongxin
Institute Of Applied Physics University Of Tsukuba
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Yatagai Toyohiko
Center For Optical Research And Education (core) Utsunomiya University
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Gomei Y
Assoc. Super‐advanced Electronics Technol. Kanagawa Jpn
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伊藤 雅英
筑波大学大学院 数理物質科学研究科 電子・物理工学専攻 計算光学グループ
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Kuroda Kenji
Faculty Of Engineering The University Of Tokushima
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NAKAMURA Tetsuro
Research Institute of Aging Science
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Ogura Iwao
Department Of Information And Image Sciences Chiba University
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Itoh Mitsuru
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Kuroda K
Central Research Laboratory Hitachi Ltd.
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Nakamura Toshihiko
Faculty Of Engineering Tokyo Institute Of Technology
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Kuroda K
International Superconductivity And Technol. Center (istec) Tokyo Jpn
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Liang R
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Liang Ruixing
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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MUROOKA Ken-ichi
Research and Development Center, Toshiba Corporation
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ITOH Masamitsu
Research and Development Center, Toshiba Corporation
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KOMANO Haruki
Research and Development Center, Toshiba Corporation
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GOMEI Yoshio
Research and Development Center, Toshiba Corporation
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Ogura I
Univ. Tokyo
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Komano Haruki
Research And Development Center Toshiba Corporation
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Murooka K
Toshiba Corp. Kawasaki Jpn
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Kuroda Kazuo
Institute Of Industrial Science Umversity Of Tokyo
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Yamasaki Satoshi
Joint Research Center For Atom Technology-national Institute For Advanced Interdisciplinary Research
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林 卓
Department Of Materials Science Shonan Institute Of Technology
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Yamasaki S
National Inst. Advanced Interdisciplinary Res. Tsukuba Jpn
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Uchida T
Institute For Semiconductor Technologies Ulvac Inc.
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Uchida Tajiro
Institute For Semiconductor Technologies Ulvac Inc.
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Tarucha S
Ntt Basic Res. Lab. Kanagawa Jpn
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Tarucha Seigo
Ntt Basic Research Laboratories
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Yamasaki S
Nec Corp. Kanagawa Jpn
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Chen W
Mcgill Univ. Pq Can
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Chen W
Welding Research Institute Osaka University
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Abe Takayuki
Ulsi Research Center Toshiba Corp.
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Uchida T
Mitsubishi Electric Corp. Hyogo Jpn
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Hayashi T
Research Laboratory Oki Electric Industry Co. Ltd.
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Tarucha Seigo
Ntt Basic Research Laboratories Ntt Corporation
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YAMASAKI Shuichi
Superconducting Sensor Laboratory
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Hayashi T
Nisshin Electric Co.
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Hayashi Tsukasa
R D Division Nissin Electric Co. Ltd.
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YAMASAKI Satoshi
ULSI research Center, Toshiba Corp.
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YOSHIKAWA Ryoichi
ULSI research Center, Toshiba Corp.
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ITOH Masayuki
Integrated Circuit Advanced Process Engineering Deaprtment, Toshiba Corp.
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TAKIGAWA Tadahiro
ULSI research Center, Toshiba Corp.
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TSAI Minghong
Institute of Applied Physics, University of Tsukuba
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LEI Feng
Institute of Applied Physics,University of Tsukuba
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Tarucha Seigo
Ntt Basic Research Laboratories:department Of Physics University Of Tokyo
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Tarucha Seigo
Ntt Electrical Communications Laboratories
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SAKU Tadashi
NTT Basic Research Laboratories
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Hayashi Takafumi
Department Of Applied Physics Faculty Of Engineering The University Of Tokyo
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Hayashi Toshiyuki
Department Of Mechanical Engineering Nagoya University
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Hayashi Takayoshi
Advanced Research Institute For Science And Engineering Waseda University
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Itoh Masayuki
Ntt Basic Research Laboratories
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Tarucha S
Ntt Basic Research Laboratories Ntt Corporation
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Lei Feng
Institute Of Applied Physics University Of Tsukuba
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Uchida Tatsuo
Tohoku University
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Tsai Minghong
Institute Of Applied Physics University Of Tsukuba
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Mitsui S
Super-fine Sr Lithography Lab. Association Of Super-advanced Electronics Technologies (aset) Co Ntt
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MOEL Alberto
Research and Development Center, Toshiba Corporation
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MITSUI Soichiro
Research and Development Center, Toshiba Corporation
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MUROOKA Ken-ichi
ULSI research Center, Toshiba Corporation
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Yoshikawa Ryoichi
Ulsi Research Laboratories Toshiba Corporation
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Takigawa T
Semiconductor Components Operations Dai Nippon Printing Co. Ltd.
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Moel Alberto
Research And Development Center Toshiba Corporation
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Takigawa Tadahiro
Ulsi Research Center Toshiba Corp
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Shigemitsu Fumiaki
Integrated Circuit Advanced Process Engineering Deaprtment Toshiba Corp.
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Chen Wei
The Department Of Electrical And Computer Engineering Nagoya Institute Of Technology
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Yoshikawa Ryoichi
Ulsi Research Center Toshiba Corporation
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Chen Wei
Department of Electrical and Computer Engineering, Nagoya Institute Technology
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Yamasaki Satoshi
ULSI Device Development Laboratories, NEC Corporation
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Chen Wei
Department of Electrical and Computer Engineering, Nagoya Institute of Technology
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Kojima Kenzo
Department Of Electrical Engineering Aichi Institute Of Technology
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SHIMURA Tsutomu
Institute of Industrial Science, University of Tokyo
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KURODA Kazuo
Institute of Industrial Science, University of Tokyo
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KAWAJI Hitoshi
Materials and Structures Laboratory, Tokyo Institute of Technology
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Fujisawa Toshio
Faculty Of Engineering Tokyo Institute Of Technology
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ITOH Masahiro
ULVAC Japan, Ltd
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KAWAJI Hitoshi
Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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Kojima Kenichi
Graduate School Of Integrated Science Yokohama City University
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Kawaji Hitoshi
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Kawaji H
Tokyo Inst. Technology Kanagawa
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Shimura Tsutomu
Institute Of Industrial Science University Of Tokyo
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OGURA Iwao
Institute of Industrial Science, University of Tokyo
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ITOH Masamitsu
ULSI Research Center, Toshiba Corporation
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GOMEI Yoshio
ULSI Research Center, Toshiba Corporation
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Ogura I
Institute Of Industrial Science University Of Tokyo
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Yamada Ryuji
Institute Of Nuclear Study University Of Tokyo
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SUGIYAMA Masakazu
Department of Electronic Engineering, School of Engineering, University of Tokyo
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FUJISAWA Toshimasa
NTT Basic Research Laboratories, NTT Corporation
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HIRAYAMA Yoshiro
NTT Basic Research Laboratories, NTT Corporation
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SHIGEMITU Fumiaki
Integrated Circuit Advanced Process Engineering Deaprtment, Toshiba Corp.
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SHIGEMITSU Fumiaki
Integrated Circuit Advanced Process Engineering Department, Toshiba Corp.
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HAYASHI Toshio
ULVAC Japan Co., Ltd.
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YOSHIKAWA Nobukazu
Institute of Applied Physics, University of Tsukuba and Tsukuba Advanced Research Alliance
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TIAN Ronglong
Institute of Applied Physics, University of Tsukuba
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SANDO Yusuke
Computational Optics Group in the University of Tsukuba
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SANDO Yusuke
Institute of Applied Physics, University of Tsukuba
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Hayashi Takahisa
Vlsi Research & Development Center Oki Electric Industry Co Ltd.
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Fujisawa Takeshi
Department Of Electronic Engineering Graduate School Of Engineering Osaka University
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Hayashi Takayoshi
Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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林 卓
マテリアル工学科
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Urabe K
Shizuoka Univ. Hamamatsu Jpn
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Gomei Yoshio
Ulsi Research Center Toshiba Corporation
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Tian Ronglong
Institute Of Applied Physics University Of Tsukuba
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Morikawa Y
Institute For Semiconductor Technologies Ulvac Inc.
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Itoh Masamitsu
Ulsi Research Center Toshiba Corporation
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Chen Wei
UVLAC Japan Ltd.
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Hayashi Toshio
UVLAC Japan Ltd.
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Itoh Masahiro
UVLAC Japan Ltd.
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Morikawa Yasuhiro
UVLAC Japan Ltd.
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Sugita Kippei
Tokai University
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Sindo Haruo
Tokai University
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Uchida Taijiro
UVLAC Japan Ltd.
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CHEN Wei
ULVAC Japan Ltd.
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UCHIDA Tajiro
ULVAC Japan Ltd.
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Hirayama Y
Ntt Corp. Kanagawa Jpn
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Hirayama Yoshiro
Ntt Basic Research Laboratories
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ITOH Masamitsu
LUIS research Center, Toshiba Corporation
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KOMANO Haruki
LUIS research Center, Toshiba Corporation
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GOMEI Yoahio
LUIS research Center, Toshiba Corporation
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KOMANO Haruki
ULSI Research Center, Toshiba Corporation
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ISHII Hisashi
Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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NAGANO Hiroshi
Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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MATSUNAGA Yoshinori
Central Research Laboratory, Kyocera Corporation
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URABE Kazuyori
Institute for Science and Technology, Ryukoku University
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Ogura Iwao
Institute Of Industrial Science Umversity Of Tokyo
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Komano Haruki
Ulsi Research Center Toshiba Corp
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Nagano H
Tokyo Electric Power Co. Yokohama Jpn
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Fujisawa Toshimasa
Ntt Basic Research Laboratories
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Ishii Hisashi
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Kuroda Kazuo
Institute Of Industrial Science University Of Tokyo
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Hirayama Y
Ntt Basic Research Laboratories Ntt Corporation
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Sugiyama Masakazu
Department Of Industrial Chemistry Faculty Of Engineering Tokai University
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Urabe Kazuyori
Institute For Science And Technology Ryukoku University
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Sugiyama Masakazu
Department Of Biotechnology Graduate School Of Agriculture And Life Sciences The University Of Tokyo
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Matsunaga Yoshinori
Central Research Laboratory Kyocera Corporation
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KURODA Keigo
Department of Materials Science, Faculty of Science, Hiroshima University
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Yamada Ryuji
Institute Of Applied Physics University Of Tsukuba
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Sando Yusuke
Institute Of Applied Physics University Of Tsukuba
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HAYASHI Teru
Research Laboratory of Precision Machinery and Electronics,Tokyo Institute of Technology
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Yoshikawa Nobukazu
Institute Of Applied Physics University Of Tsukuba And Tsukuba Advanced Research Alliance
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Watanabe Shuntaro
Institute Of Industrial Science Umversity Of Tokyo
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Itoh Masahiro
Ulvac Japan Ltd
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Hayashi Toshio
Ulvac Corporation
著作論文
- Generation of Phase-Conjugate Wave in a Photorefractive GaP at 633 nm
- Performance Evaluation of Representative Figure Method for Proximity Effect Correction : Electron Beam Lithography
- Performance Evaluation of Representative Figure Method for Proximity Effect Correction
- 研究速報 : RELATIONSHIP BETWEEN OPTICAL DAMAGE THRESHOLD AND RESIDUAL ABSORPTION IN EXCIMER LASER COMPONENTS
- 研究速報 : 0bservation of Thermal Stresses Induced by Laser Irradiation in Transparent Optical Materials
- Fractional Fringe Order Method Using Fourier Analysis for Absolute Measurement of Block Gauge Thickness
- Phase Retrieval of Phase-Shifting Interferometry with Iterative Least-Squares Fitting Algorithm : Experiments
- Optical Implementation of Entropy Network Mapped from Binary Feature Tree
- Broad-Band Light-Wave Correlation Topography Using Wavelet Transform
- Computer-Generated Holograms Based on the Three-Dimensional Fourier Spectrum
- Optical Entropy Network Mapped from Binary Feature Tree
- Polarization Multi-functional Image Switch for Optical Interconnection and Parallel Processing
- Optical Module for Modified Signed-Digit Computing Based on Bit Plane Encoding and Pattern Operations
- Parallel Modified Signed-Digit Computing for Large-Scale Two Dimensional Data Array
- Magnetic Neutral Loop Discharge (NLD) Plasma and Application to SiO_2 Etching Process
- Dry Etch Process in Magnetic Neutral Loop Discharge Plasma
- Transport Properties of Modulation-Doped Structures Grown by Molecular Beam Epitaxy after Focused Ion Beam Implantation
- Improvement in Optical Transparency of SiC Membrane by Modulating Source Gas Ratio in Chemical Vapor Deposition
- Mask Distortion Analysis for the Fabrication of 1 GBit Dynamic Random Access Memories by X-Ray Lithography
- Study on X-Ray Mask Distortion Applying Direct Bonding to Frame Mounting
- High-Mobility Quantum Wires Fabricated by Ga Focused Ion Beam Shallow Implantation
- The Effects of HCl Added to Chemical Vapor Deposition Source Gases for Producing a SiC X-Ray Mask Membrane : X-Ray Lithography
- The Effects of HCl Added to Chemical Vapor Deposition Source Gases for Producing a SiC X-Ray Mask Membrane
- Synthesis of Superconducting 2223 Compound in the Lead-Added Bi-Sr-Ca-Cu-O System
- Evidence of Sr-Deficiency in Bi_2Sr_Ca_1Cu_2O_8 and Preparation of Stoichiometric Semiconducting Bi_2Sr_2Ca_1Cu_2O_8
- Reproducible Processing for High-T_c Superconducting Tl-Ba-Ca-Cu-O-Phases : Electrical Properties of Condensed Matter