Gomei Y | Assoc. Super‐advanced Electronics Technol. Kanagawa Jpn

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概要

• GOMEI Yoshioの詳細を見る
• 同名の論文著者
• Assoc. Super‐advanced Electronics Technol. Kanagawa Jpnの論文著者

関連著者

• Gomei Y

  Assoc. Super‐advanced Electronics Technol. Kanagawa Jpn

• Gomei Yoshio

  Ulsi Research Center Toshiba Corporation

• Itoh M

  Institute Of Applied Physics University Of Tsukuba

• Itoh M

  Institute Of Industrial Science University Of Tokyo

• Itoh M

  Research Laboratory Of Engineering Materials Tokyo Institute Of Technology

• KOMANO Haruki

  Research and Development Center, Toshiba Corporation

• Komano Haruki

  Research And Development Center Toshiba Corporation

• GOMEI Yoshio

  ULSI Research Center, Toshiba Corporation

• Nomura H

  Toshiba Corp. Yokohama Jpn

• Kikuchi Y

  Aset Super‐fine Sr Lithography Lab. Kanagawa Jpn

• Kikuchi Yukiko

  Aset Super-fine Sr Lithography Laboratory Co Ntt Telecommnications Energy Laboratories

• Kikuchi Yukiko

  Super-fine Sr Lithography Laboratory Association Of Super-advanced Electronics Technologies(aset) At

• Kikuchi Yukiko

  Ulsi Research Center Toshiba Corporation

• NOMURA Hiroshi

  ULSI Research Laboratories, Toshiba Corporation

• Nomura H

  Laboratory Of Chemistry Department Of Natural Science School Of Science And Technology Tokyo Denki U

• MUROOKA Ken-ichi

  Research and Development Center, Toshiba Corporation

• ITOH Masamitsu

  Research and Development Center, Toshiba Corporation

• GOMEI Yoshio

  Research and Development Center, Toshiba Corporation

• Komano Haruki

  Ulsi Research Center Toshiba Corp

• Murooka K

  Toshiba Corp. Kawasaki Jpn

• Komeya Katutoshi

  Graduate School Of Environment And Information Science Yokohama National University

• Kondo Kazuhiro

  Fujitsu Laboratories Ltd.

• Kondo K

  Fujitsu Laboratories Ltd.

• KONDO Kenzo

  ULSI Research Laboratories, Toshiba Corporation

• HIGASHIKAWA Iwao

  ULSI Research Laboratories, Toshiba Corporation

• Mitsui S

  Super-fine Sr Lithography Lab. Association Of Super-advanced Electronics Technologies (aset) Co Ntt

• MOEL Alberto

  Research and Development Center, Toshiba Corporation

• MITSUI Soichiro

  Research and Development Center, Toshiba Corporation

• MUROOKA Ken-ichi

  ULSI research Center, Toshiba Corporation

• Higashikawa I

  Ulsi Research Laboratories Toshiba Corporation

• Moel Alberto

  Research And Development Center Toshiba Corporation

• NAKAMURA Hiroko

  ULSI Research Center, Toshiba Corporation

• NORIMATU Kenji

  Semiconductor Division, Toshiba Corp.

• Norimatu Kenji

  Semiconductor Division Toshiba Corp.

• Nakamura Hiroko

  Ulsi Research Center Toshiba Corporation

• ITOH Masamitsu

  ULSI Research Center, Toshiba Corporation

• Itoh Masamitsu

  Ulsi Research Center Toshiba Corporation

• ITOH Masamitsu

  LUIS research Center, Toshiba Corporation

• KOMANO Haruki

  LUIS research Center, Toshiba Corporation

• GOMEI Yoahio

  LUIS research Center, Toshiba Corporation

• KOMANO Haruki

  ULSI Research Center, Toshiba Corporation

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著作論文

• Effects of Mask Line-and-Space Ratio in Replicating near-0.1-μm Patterns in X-Ray Lithography
• Sub-0.15 μm Pattern Replication Using a Low-Contrast X-Ray Mask
• Analysis of Sub-0.15 μm Pattern Replication in Synchrotron Radiation Lithography
• Improvement in Optical Transparency of SiC Membrane by Modulating Source Gas Ratio in Chemical Vapor Deposition
• Mask Distortion Analysis for the Fabrication of 1 GBit Dynamic Random Access Memories by X-Ray Lithography
• Study on X-Ray Mask Distortion Applying Direct Bonding to Frame Mounting
• The Effects of HCl Added to Chemical Vapor Deposition Source Gases for Producing a SiC X-Ray Mask Membrane : X-Ray Lithography
• The Effects of HCl Added to Chemical Vapor Deposition Source Gases for Producing a SiC X-Ray Mask Membrane
• Silicon Oxide Deposition into a Hole Using a Focused Ion Beam : Focused Ion Beam Process
• Silicon Oxide Deposition into a Hole Using a Focused Ion Beam

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