Mask Distortion Analysis for the Fabrication of 1 GBit Dynamic Random Access Memories by X-Ray Lithography
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-12-30
著者
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Itoh M
Institute Of Applied Physics University Of Tsukuba
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Itoh M
Institute Of Industrial Science University Of Tokyo
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Itoh M
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Gomei Y
Assoc. Super‐advanced Electronics Technol. Kanagawa Jpn
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Mitsui S
Super-fine Sr Lithography Lab. Association Of Super-advanced Electronics Technologies (aset) Co Ntt
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ITOH Masamitsu
Research and Development Center, Toshiba Corporation
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GOMEI Yoshio
Research and Development Center, Toshiba Corporation
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MOEL Alberto
Research and Development Center, Toshiba Corporation
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MITSUI Soichiro
Research and Development Center, Toshiba Corporation
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Moel Alberto
Research And Development Center Toshiba Corporation
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