Silicon Oxide Film Formation by Focused Ion Beam (FIB)-Assisted Deposition : Beam Induced Physics and Chemistry
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1989-12-30
著者
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TAKIGAWA Tadahiro
ULSI research Center, Toshiba Corp.
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Komano Haruki
Ulsi Research Center Toshiba Corp
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OGAWA yuuji
ULSI Research Center, Toshiba Corp
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Takigawa Tadahiro
Ulsi Research Center Toshiba Corp
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Ogawa Yuuji
Ulsi Research Center Toshiba Corp
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