Main-Field Stitching Accuracy Analysis in Electron Beam Writing Systems

概要

論文の詳細を見る
A new evaluation method for main-field positioning error for electron beam (F-Beam) writing systems has been developed. Main-field distortion caused by system-based rnain-field positioning error such as contamination charging, deflector calibration error, substrate height error and so on is the main factor impairing accuracy in E-Beam writing systems. Main-field distortion after elimination of deflection distortion is classified into four modes. The origin of main-field positioning error can be estimated by investigating the behavior of these four modes of main-field distortion. This method has been applied to the variable shaped beam (VSB), vector scanning, and continuously moving stage E-Beam system. Contamination charging problems in the final lens surface in opposition to substrate and problems in the deflector calibration method have been found. Main-field positioning error of the E-Beam system decreased from 0.1 μm to 0.04 μm after solving the above problerns. The evaluation method for main-field positioning error has beeta proved to be very effective in accuracy improvement of E-Beam systems.
社団法人応用物理学会の論文
1992-12-30