Investigation of High-Precision Lithography Lens Aberration Measurement Based on Three-Beam Interference Theory : Sensitivity versus Coherent Factor and Variations with Dose and Focus
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概要
- 論文の詳細を見る
- 2000-12-01
著者
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Nomura H
Toshiba Corp. Yokohama Jpn
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Nomura Hiroshi
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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