A Novel Technique for Measuring Defocus with Phase Shift Gratings on a Photomask
スポンサーリンク
概要
- 論文の詳細を見る
- 2001-06-01
著者
関連論文
- Accurate Measurement of Spherical and Astigmatic Aberrations by a Phase Shift Grating Reticle : Semiconductors
- Measurement of Wave-Front Aberrations in Lithography Lenses with an Overlay Inspection Tool
- A Novel Technique for Measuring Defocus with Phase Shift Gratings on a Photomask
- Impact of Reticle Topography on Field Curvature and Overlay Errors in Optical Lithography
- Investigation of High-Precision Lithography Lens Aberration Measurement Based on Three-Beam Interference Theory : Sensitivity versus Coherent Factor and Variations with Dose and Focus
- Aberration Monitoring toward Wavefront Matching with Device Patterns