Shirai Hajime | The Graduate School At Nagatsuta Tokyo Institute Of Technology:(present Address) Saitama University
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概要
- 同名の論文著者
- The Graduate School At Nagatsuta Tokyo Institute Of Technology:(present Address) Saitama University の論文著者
関連著者
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Shirai Hajime
The Graduate School At Nagatsuta Tokyo Institute Of Technology:(present Address) Saitama University
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SHIMIZU Isamu
The Graduate School at Nagatsuta
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Shimizu I
Osaka Univ. Osaka Jpn
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Shimizu I
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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SHIRAI Hajime
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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Hanna J
Tokyo Inst. Technol. Yokohama Jpn
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HANNA Jun-ichi
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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Shimizu Isamu
Imaging Science And Engineering Laboratory Tokyo Institute Of Technology
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GOTOH Jun
Central Research Laboratory, Hitachi Ltd.
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Gotoh Jun
Central Research Laboratory Hitachi Ltd.
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NAKATA Masami
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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NAKATA Masami
Tokyo Institute of Technology, Graduate School
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GOTOH Jun
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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Nakata Masami
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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小田 俊理
東工大工
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小田 俊理
東京工業大学量子ナノエレクトロニクス研究センター
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Shibata N
Japan Fine Ceramics Center Nagoya Jpn
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Fukuda K
Electrotechnical Lab. Ibaraki Jpn
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Oda S
Tokyo Inst. Technology Tokyo Jpn
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Oda S
Tokyo Inst. Technol. Tokyo Jpn
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Oda Shunri
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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SHIBATA Naoki
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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FUKUDA Kaichi
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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OHTOSHI Hirokazu
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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MIYAUCHI Akihiro
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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TANABE Akihito
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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Shibata N
Ntt Optoelectronics Laboratories Nippon Telegraph And Telephone Corporation
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Shibata N
Japan Fine Ceramics Center Nggoya Jpn
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Namikawa Tatsuru
Tokyo Institute Of Technology
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Namikawa Tatsuru
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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Oda Shunri
The Graduate School At Nagatsuta And Imaging Science And Engineering Laboratory Tokyo Institute Of T
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MIYAUCHI Akihiro
Hitachi Research Laboratory, Hitachi Ltd.
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Fukuda Kuniya
Department Of Engineering Physics Faculty Of Engineering Kyoto University
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Namikawa T
Tokyo Institute Of Technology
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Tanabe Akihito
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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Miyauchi Akihiro
Hitachi Research Laboratory Hitachi Ltd.
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SAKAI Akira
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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HANNA Junichi
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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Das Debajyoti
The Graduate School at Nagatsuka, Tokyo Institute of Technology
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Kobayashi T
Mitsubishi Heavy Industrial Co. Ltd. Nagoya Jpn
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Das Debajyoti
The Graduate School At Nagatsuka Tokyo Institute Of Technology:energy Research Unit Indian Associati
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DREVILLON Bernard
Laboratoire de Physique des Interfaces et des Couches Minces, (UPR A0258 du CNRS), Ecole Polytechniq
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KOBAYASHI Tohru
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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Drevillon Bernard
Laboratoire De Physique Des Interfaces Etdes Couches Minces (upr A0258 Du Cnrs) Ecole Polytechnique
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Drevillon Bernard
Laboratoire De Physique Des Interfaces Et Des Couches Minces (upr A0258 Du Cnrs) Ecole Polytechnique
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Hanna Junichi
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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Sakai Akira
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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Ohtoshi Hirokazu
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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Ishihara Shun'ichi
The Graduate School At Nagatsuta Tokyo Institute Of Technology
著作論文
- The Role of Hydrogen Radicals in the Growth of a-Si and Related Alloys
- Study on Chemical Reactions on the Growing Surface to Control the Structures of μc-Silicon from Fluorinated Precursors
- Improvement of Photoluminescence Properties of ZnSe Film Grown by Hydrogen Radical-Enhanced Chemical Vapor Deposition Using Alternate Gas Supply and Substrate Bias Application
- Very Stable a-Si:H Prepared by "Chemical Annealing"
- Narrow Band-Gap a-Si:H with Improved Minority Carrier-Transport Prepared by Chemical Annealing
- Coherent Growth of ZnSe Thin Film at Low Growth Temperature by Hydrogen Radical Enhanced Chemical Vapor Deposition
- Preparation of μc-Si:H/a-Si:H Multilayers and Their Optoelectric Properties
- Silicon-Hydrogen (SiH_n, (n,=1, 2, 3)) Bonding Configurations in Very Thin Hydrogenated Amorphous Silicon Films Deposited on Various Kinds of Substrates under Different SiH_4 Dilution Conditions