Shimizu I | The Graduate School At Nagatsuta Tokyo Institute Of Technology
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概要
関連著者
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Shimizu I
Osaka Univ. Osaka Jpn
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Shimizu I
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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SHIMIZU Isamu
The Graduate School at Nagatsuta
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Shimizu Isamu
Imaging Science And Engineering Laboratory Tokyo Institute Of Technology
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Hanna J
Tokyo Inst. Technol. Yokohama Jpn
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小田 俊理
東工大工
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Oda S
Tokyo Inst. Technol. Tokyo Jpn
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Oda Shunri
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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HANNA Jun-ichi
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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Oda Shunri
The Graduate School At Nagatsuta And Imaging Science And Engineering Laboratory Tokyo Institute Of T
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小田 俊理
東京工業大学量子ナノエレクトロニクス研究センター
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Oda S
Tokyo Inst. Technology Tokyo Jpn
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Shirai Hajime
The Graduate School At Nagatsuta Tokyo Institute Of Technology:(present Address) Saitama University
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神谷 武志
東大工
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Fortmann C
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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Katase Takayoshi
Aterials And Structures Laboratory Tokyo Institute Of Technology
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神谷 利夫
Materials And Structures Laboratory Tokyo Institute Of Technology
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Kamiya Toshio
Kochi Prefectural Industrial Technology Center
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Shibata N
Japan Fine Ceramics Center Nagoya Jpn
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SHIBATA Naoki
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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SHIRAI Hajime
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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Shibata N
Ntt Optoelectronics Laboratories Nippon Telegraph And Telephone Corporation
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Shibata N
Japan Fine Ceramics Center Nggoya Jpn
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神谷 武志
東京大学大学院電子工学専攻
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SHIRAI Hajime
Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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TANABE Akihito
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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Nakamura Toshihiko
Faculty Of Engineering Tokyo Institute Of Technology
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Tanabe Akihito
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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SHIMIZU Isamu
Graduate School, Tokyo Institute of Technology
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神谷 武志
Department Of Gastroenterology And Metabolism Nagoya City University Graduate School Of Medical Scie
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NAKAMURA Tetsuro
Research Institute of Aging Science
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ISHIHARA Shinji
Research Reactor Institute, Kyoto University
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KAMIYA Toshio
Materials and Structures Laboratory, Tokyo Institute of Technology
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Kamiya Toshio
Materials And Structures Laboratory Tokyo Institute Of Technology
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Nakahata Kouichi
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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RO Kazuyoshi
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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Ro Kazuyoshi
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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Shimizu Isamu
Tokyo Institute of Technology
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HE Deyan
Tokyo Institute of Technology, Graduate School
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NAKATA Masami
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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NAKATA Masami
Tokyo Institute of Technology, Graduate School
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Ishihara Shinji
Research Teactor Institute Kyoto University
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Ishihara S
Tokyo Institute Of Technology Graduate School
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He Deyan
Tokyo Institute Of Technology Graduate School
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Nakata Masami
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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節原 裕一
国立大学法人大阪大学接合科学研究所
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三宅 正司
近畿大学リエゾンセンター
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Fujiwara H
Tsukuba Research Laboratory Hitachi Maxell Ltd.
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Fukuda K
Electrotechnical Lab. Ibaraki Jpn
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FUKUDA Kaichi
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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OHTOSHI Hirokazu
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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MIYAUCHI Akihiro
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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Shimizu Isao
Semiconductor Leading Edge Technologies Inc.
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Fujiwara H
Toshiba Corp. Yokohama Jpn
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Maeda Y
Deparment Of Information And Control Engineering Toyota Technological Institute
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GOTOH Jun
Central Research Laboratory, Hitachi Ltd.
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Fortmann Charles
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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Fujiwara Hiroyuki
Department Of Materials Science And Processing Graduate School Of Engineering Osaka University
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Maeda Y
Center For Microelectronic Systems Kyushu Institute Of Technology
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Maeda Y
The Institute Of Scientific And Industrial Research Osaka University
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Fortmann Charles
Interdisiplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Shimizu Isamu
Interdisiplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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NAKAHATA Kouichi
The Graduate School, Tokyo Institute of Technology
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MIYAUCHI Akihiro
Hitachi Research Laboratory, Hitachi Ltd.
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Gotoh Jun
Central Research Laboratory Hitachi Ltd.
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Fukuda Kuniya
Department Of Engineering Physics Faculty Of Engineering Kyoto University
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Shimizu Satoshi
Graduate School Tokyo Institute Of Technology
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Akasaka T
Univ. Tsukuba Ibaraki Jpn
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Miyauchi Akihiro
Hitachi Research Laboratory Hitachi Ltd.
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FORTMANN Charles
Graduate School, Tokyo Institute of Technology
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FUJIWARA Hiroyuki
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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NABETA Toshiyuki
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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ARAKI Yuhzo
Graduate School, Tokyo Institute of Technology
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ISHIHARA Shun-ichi
Tokyo Institute of Technology, Graduate School
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GOTOH Jun
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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Maeda Yukio
Department Of Applied Physics Tokyo University Of Agriculture And Technology
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Araki Y
Tokyo Elecctron Yamanashi Ltd. Yamanashi Jpn
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Nabeta Toshiyuki
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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Ohtoshi Hirokazu
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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Shimizu Ippei
Joining And Welding Research Institute Osaka University
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MIYAKE Shoji
Osaka University
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NAKAMURAI Tetsuro
Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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TOKUNAGA Hiroyuki
The Graduate School at Nagatsuta, and Imaging Socience and Engineering Laboratory,Tokyo Institute of
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KITAJIMA Nobuyuki
The Graduate School at Nagatsuta, and Imaging Socience and Engineering Laboratory,Tokyo Institute of
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KOKADO Hiroshi
The Graduate School at Nagatsuta, and Imaging Socience and Engineering Laboratory,Tokyo Institute of
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SETSUHARA Yuichi
Joining and Welding Research Institute, Osaka University
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MIYAKE Shoji
Joining and Welding Research Institute, Osaka University
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SAITOU Hidenori
Kanagawa High-Technology Foundation
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KUMAGAI Masao
Kanagawa Industrial Technology Research Institute
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HE Jianli
Osaka University
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SETSUHARA Yuichi
Osaka University
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SHIMIZU Ippei
Osaka University
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Namikawa Tatsuru
Tokyo Institute Of Technology
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Namikawa Tatsuru
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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Kitajima Nobuyuki
The Graduate School At Nagatsuta And Imaging Socience And Engineering Laboratory Tokyo Institute Of
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Tokunaga Hiroyuki
The Graduate School At Nagatsuta And Imaging Socience And Engineering Laboratory Tokyo Institute Of
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Komaru Takashi
Interdisiplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Shimizu Satoshi
Interdisiplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Kanbe Mika
Interdisiplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Maeda Yoshiteru
Interdisiplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Kamiya Toshio
Interdisiplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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MIIDA Atsushi
The Graduate School, Tokyo Institute of Technology
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MAEDA Yoshiteru
The Graduate School, Tokyo Institute of Technology
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Kanbe Mika
Interdisiplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Miida Atsushi
The Graduate School Tokyo Institute Of Technology
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Miyake Shoji
Joining & Welding Resarch Institute Osaka University
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Kumagai M
Kanagawa Industrial Technology Research Institute
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Azuma Masanobu
Graduate School Tokyo Institute Of Technology
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Hanna Jun-ichi
Tokyo Institute Of Technology Imaging Science And Engineering Laboratory
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Kokado Hiroshi
The Graduate School At Nagatsuta And Imaging Socience And Engineering Laboratory Tokyo Institute Of
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SUEMASU Atsushi
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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KAMIYA Toshio
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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Nakahata Kouichi
Interdiciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Ro Kazuyoshi
Interdiciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Suemasu Atsushi
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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Kamai Masayoshi
Joining And Welding Research Institute Osaka University
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Namikawa T
Tokyo Institute Of Technology
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Saitou H
Kanagawa High‐technol. Foundation Kawasaki Jpn
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Shirai Hajime
Tokyo Institute Of Technology The Graduate School At Nagatsuta:(present Address) The Faculty Of Engi
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KOMARU Takashi
Graduate School, Tokyo Institute of Technology
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OKAWA Kojiro
Graduate School, Tokyo Institute of Technology
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KAMIYA Toshio
Graduate School, Tokyo Institute of Technology
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Ro Kazuyoshi
Graduate School, Tokyo Institute of Technology
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Fortmann Chales
Graduate School, Tokyo Institute of Technology
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KIRYU Hideaki
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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AKASAKA Tetsuya
Graduate School, Tokyo Institute of Technology
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HE Deyan
Graduate School at Nagatsuda, Tokyo Institute of Technology
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ISHIHARA Shun-ichi
Graduate School at Nagatsuda, Tokyo Institute of Technology
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AKASAKA Tetsuya
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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ARAKI Yuhzo
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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SAKAI Akira
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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HANNA Junichi
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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Das Debajyoti
The Graduate School at Nagatsuka, Tokyo Institute of Technology
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Setsuhara Yuichi
Joining And Welding Research Institute Osaka University
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Kobayashi T
Mitsubishi Heavy Industrial Co. Ltd. Nagoya Jpn
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Das Debajyoti
The Graduate School At Nagatsuka Tokyo Institute Of Technology:energy Research Unit Indian Associati
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KOBAYASHI Tohru
The Graduate School at Nagatsuta, Tokyo Institute of Technology
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Okawa K
Graduate School Tokyo Institute Of Technology
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Hanna Junichi
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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Kiryu Hideaki
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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Sakai Akira
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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Ishihara Shun'ichi
The Graduate School At Nagatsuta Tokyo Institute Of Technology
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Kumagai Masao
Kanagawa High-Technology Foundation, Kanagawa Science Park, Kawasaki, Kanagawa 213, Japan
著作論文
- Preparation Method and Optoelectrical Properties of a-Se/Cd_xSe_ Multilayer Films
- Design of Band Potential with a-Si_xGe_:H(F) Alloys
- Hole Transport in Silicon Thin Films with Variable Hydrogen Content
- Preparation of Polycrystalline Silicon by Hydrogen-Radical-Enhanced Chemical Vapor Deposition
- Hole Transport in a-Si:H(F) Prepared by Hydrogen-Radical-Assisted Chemical Vapor Deposition
- Preparation of Highly Photoconductive a-SiGe_x from Fluorides by Controlling Reactions with Atomic Hydrogen
- Designing New Materials with Amorphous Semiconductors : Structure and Electrical Properties of Multiply Stacked a-Si/a-SiGe_x Layers
- The Role of Hydrogen Radicals in the Growth of a-Si and Related Alloys
- Highly Oriented ZnO Films Prepared by MOCVD from Diethylzinc and Alcohols
- Effects of Ion-Beam-Irradiation on Morphology and Densification of CeO_2 Films Prepared by Ion-Beam-Assisted Deposition
- Mechanical Property of Dissimilar Material Nanocomposites Prepared by Ion Beam Assisted Sputtering Process(Physics, Processes, Instruments & Measurements)
- Optimization of Transparent Conductive Oxide for Improved Resistance to Reactive and/or High Temperature Optoelectronic Device Processing
- Control of Orientation for Polycrystalline Silicon Thin Films Fabricated from Fluorinated Source Gas by Microwave Plasma Enhanced Chemical Vapor Deposition
- Fabrication of Polycrystalline Silicon Films from SiF_4/H_2/SiH_4 Gas Mixture Using Very High Frequency Plasma Enhanced Chemical Vapor Deposition with In Situ Plasma Diagnostics and Their Structural Properties.
- Comparison of Microstructure and Crystal Structure of Polycrystalline Silicon Exhibiting Varied Textures Fabricated by Microwave and Very High Frequency Plasma Enhanced Chemical Vapor Deposition and Their Transport Properties
- Fabrication of Solar Cells Having SiH_2Cl_2 Based I-Layer Materials
- Role of Seed Crystal Layer in Two-Step-Growth Procedure for Low Temperature Growth of Polycrystalline Silicon Thin Film from SiF_4 by a Remote-Type Microwave Plasma Enhanced Chemieal Vapor Deposition
- Preparation and Properties of (ZnS)_3(ZnSe)_ Ordered Alloys Fabricated by Plasma-Enhanced Low-Temperature Growth Technique ( Plasma Processing)
- Structures and Properties of (ZnS)_n(ZnSe)_m(n=1-4) Ordered Alloys Grown by Atomic Layer Epitaxy
- Si Epitaxy below 400℃ from Fluorinated Precursors SiF_nH_m (n + m ≤ 3) under In Situ Observation with Ellipsometry
- Structure of Polycrystalline Silicon Thin Film Fabricated from Fluorinated Precursors by Layer-by-Layer Technique
- Structural and Electrical Properties of n-Type Poly-Si Films Prepared by Layer-by-Layer Technique
- In Situ Ellipsometric Observations of the Growth of Silicon Thin Films from Fluorinated Precursors, SiF_nH_m(n+m
- Preparation of High-Quality Microcrystalline Silicon from Fluorinated Precursors by a Layer-by-Layer Technique
- Study on Chemical Reactions on the Growing Surface to Control the Structures of μc-Silicon from Fluorinated Precursors
- Improvement of Photoluminescence Properties of ZnSe Film Grown by Hydrogen Radical-Enhanced Chemical Vapor Deposition Using Alternate Gas Supply and Substrate Bias Application
- Very Stable a-Si:H Prepared by "Chemical Annealing"
- Role of Atomic Hydrogen During Growth of Hydrogenated Amorphous Silicon in the "Chemical Annealirng"
- Narrow Band-Gap a-Si:H with Improved Minority Carrier-Transport Prepared by Chemical Annealing
- Coherent Growth of ZnSe Thin Film at Low Growth Temperature by Hydrogen Radical Enhanced Chemical Vapor Deposition
- Preparation of μc-Si:H/a-Si:H Multilayers and Their Optoelectric Properties
- Amplification of Photoconductive Gain with Space Charge Doping nini Multilayered Structure