SETSUHARA Yuichi | Osaka University

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概要

• Setsuhara Yuichiの詳細を見る
• 同名の論文著者
• Osaka Universityの論文著者

関連著者

• SETSUHARA Yuichi

  Osaka University

• MIYAKE Shoji

  Osaka University

• 節原 裕一

  国立大学法人大阪大学接合科学研究所

• MAKINO Yukio

  Osaka University

• Makino Y

  Osaka Univ. Osaka Jpn

• KAMAI Masayoshi

  Osaka University

• Kumagai M

  Kanagawa Industrial Technology Research Institute

• Kamai Masayoshi

  Joining And Welding Research Institute Osaka University

• OHNISHI Ryosuke

  Osaka University

• MORI Hirotaro

  Research Center for Ultrahigh Voltage Electron Microscopy, Osaka University

• 三宅 正司

  近畿大学リエゾンセンター

• SAKATA Takao

  Research Center for Ultra-high Voltage Electron Microscopy, Osaka University

• ABE Nobuyuki

  Osaka University

• Shimizu Isao

  Semiconductor Leading Edge Technologies Inc.

• HAYASHI Tsukasa

  Nissin Electric Co.

• Hayashi Tsukasa

  Nissin Electric Co. Ltd R&d Laboratories

• Shimizu I

  Osaka Univ. Osaka Jpn

• HE Jianli

  Osaka University

• SHIMIZU Ippei

  Osaka University

• TAKAHASHI Eiji

  Nissin Electric Co., Ltd. Process Research Center R&D Laboratories

• OGATA Kiyoshi

  Nissin Electric Co., Ltd. Process Research Center R&D Laboratories

• MUSIL Jindrich

  Department of Physics, University of West Bohemia

• NISHIGAMI Yasuaki

  Nissin Electric Co., Ltd, R&D Laboratories

• TOMYO Atsushi

  Nissin Electric Co., Ltd, R&D Laboratories

• FUJIWARA Masaki

  Nissin Electric Co., Ltd, R&D Laboratories

• KAKI Hirokazu

  Nissin Electric Co., Ltd, R&D Laboratories

• KUBOTA Kiyoshi

  Nissin Electric Co., Ltd, R&D Laboratories

• EBE Akinori

  EMD Corp.

• ARIYASU Tomio

  Kansai University

• Tomyo Atsushi

  Nissin Electric Co. Ltd R&d Laboratories

• Kaki Hirokazu

  Nissin Electric Co. Ltd R&d Laboratories

• Kubota Kazuyoshi

  Atr Adaptive Communications Research Laboratories

• Nishigami Yasuaki

  Nissin Electric Co. Ltd R&d Laboratories

• Suzuki T

  Muroran Inst. Technol. Jpn

• Shimizu I

  The Graduate School At Nagatsuta Tokyo Institute Of Technology

• Shimizu Isamu

  Imaging Science And Engineering Laboratory Tokyo Institute Of Technology

• Seto N

  Osaka Univ. Osaka Jpn

• Ebe Akinori

  Osaka University

• Sakata Takao

  Research Center For Ultra-high Voltage Electron Microscopy Osaka University

• Yoshinaga Jun

  Kansai University

• Ogata Kiyoshi

  Nissin Electric Co. Ltd. Kyoto Jpn

• Ogata Kiyoshi

  Nissin Electric Co. Ltd R&d Laboratories

• Mori Hirotaro

  Research Center For Ultra-high Voltage Electron Microscopy Osaka University

• Mori Hirotaro

  Research Center For Ultre-high Voltage Electron Microscopy Osaka University

• Musil Jindrich

  Department Of Physics University Of West Bohemia

• Kubota Kiyoshi

  Nissin Electric Co. Ltd R&d Laboratories

• Tabata Yuji

  Osaka University

• SUZUKI Tsuneo

  Osaka University

• CHEN Wei

  Osaka University

• Hayashi Tsukasa

  Nissin Electric Co. Ltd. R&d Laboratories

• KYOU Bunkei

  Kinki University

• ZHANG Jinqiu

  Osaka University

• SETO Naoki

  Kinki University

• MISINA Martin

  Institute of Physics, Academy of Sciences of The Czech Republic

• MUSIL Jindrich

  Institute of Physics, Academy of Sciences of the Czech Republic

• KINOSHITA Shichi

  Osaka University

• WANG Yu

  Space Science and Application Research Center

• SHIBATA Kazuo

  Osaka University

• OHSAKO Hajime

  Osaka University

• SAMOTO Hirotaka

  Kinki University

• Setsuhara Yuichi

  Osaka University Joining And Welding Research Institute

• UEDA Kunitsugu

  Osaka Univ.

• Zhang J

  Xi'an Jiaotong Univ.

• Misina M

  Osaka Univ. Osaka Jpn

• Misina Martin

  Institute Of Physics Academy Of Sciences Of The Czech Republic

• Takahashi Eiji

  Nissin Electric Co. Ltd R&d Laboratories

• SETSUHARA Yuicji

  Osaka University

• Yamada Sumasu

  Setsunan University

• Fujiwara Masaki

  Nissin Electric Co. Ltd R&d Laboratories

• Abe Nobuyuki

  Osaka Univ. Osaka Jpn

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著作論文

• Mechanical Property of Dissimilar Material Nanocomposites Prepared by Ion Beam Assisted Sputtering Process(Physics, Processes, Instruments & Measurements)
• Large-Area and High-Speed Deposition of Microcrystalline Silicon Film by Inductive Coupled Plasma using Internal Low-Inductance Antenna
• Properties of (Ti, Al) N films prepared by ion beam assisted deposition(Physics, Process, Instrument & Measurements)
• Helicon Wave Plasma Enhanced Sputtering and Application to Synthesis of Carbon Nitride Films(Physics, Process, Instrument & Measurements)
• Use of Focused High-Power 60-GHz Radiation Beams for Advanced Sintering of Ceramics(Physics, Processes, Instruments & Measurements)
• Heating and Sintering of Alumina using High-Power Pulsed 60-GHz Gyrotron(Physics, Process, Instruments & Measurements)
• Ion and Neutral Particle Diagnostics in Reactive ECR Plasma(Physics, Process, Instruments & Measurements)
• Formation and Structure of Crystalline Phase TiB_2 Films by Ion Beam Assisted Deposition(Physics, Process, Instrument & Measurements)
• Influence of Ion Irradiation on Crystalline Phases of Oxide Films(Materials, Metallurgy & Weldability)
• Ti-Al Alloy Films Synthesized by Ion-Beam-Enhanced Deposition(Physics, Process, Instrument & Measurements)
• Inductively Coupled RF Discharges Using Helical Antennas(Physics, Process, Instruments & Measurements)
• Metallization on Polyimide Film by Ion and Vapor Deposition (IVD) Method(Physics, Processes, Instruments & Measurements)
• Application o f Microwave Thermal Plasma to Ceramics Sintering(Physics, Process, Instruments & Measurements)
• Effect of Magnetic Mirror Plasma Confinement on Microwave Electron Cyclotron Resonance/D.C. Discharge for Low Pressure Sputtering(Physics, Process, Instrument & Measurements)

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