Takahashi Eiji | Nissin Electric Co. Ltd R&d Laboratories

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著作論文

Electron Injection into Si Nanodot Fabricated by Side-Wall Plasma Enhanced Chemical Vapor Deposition
Large-Area and High-Speed Deposition of Microcrystalline Silicon Film by Inductive Coupled Plasma using Internal Low-Inductance Antenna
Surface Passivation of Crystalline Silicon by Combination of Amorphous Silicon Deposition with High-Pressure H2O Vapor Heat Treatment
Low Temperature Polycrystalline Silicon Thin Film Transistors Flash Memory with Silicon Nanocrystal Dot
Electron Injection into Si Nanodot Fabricated by Side-Wall Plasma Enhanced Chemical Vapor Deposition

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