Formation and Structure of Crystalline Phase TiB_2 Films by Ion Beam Assisted Deposition(Physics, Process, Instrument & Measurements)

概要

論文の詳細を見る
Ion beam assisted deposition (IBAD) technique was used to fabricate TiB_2 films using argon ion bombardment during the deposition of TiB_2 by electron beam evaporation. The formation and dependence of crystalline structure and microhardness of TiB_2 films on the energy of Ar^+ were studied by changing the Ar^+ energy from 2 to 20keV while keeping the transport ratio constant. Ruthurford backscattering spectroscopy indicated that the film composition had stoichiometry of TiB_2. The as-deposited film, prepared without Ar^+ bombardment, was found to be non-crystalline (or lack of long range order) and had relatively low microhardness. The films deposited with simultaneous Ar^+ bombardment were crystalline and had very high microhardness over 3000kgf/mm^2 when the energy of Ar^+ was larger than 5keV.
大阪大学の論文