Low Temperature Synthesis of SrTiO_3 Films by Mirror Confinement Type ECR Plasma Sputtering(Physics, Processes, Instruments & Measurements)
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Strontium titanate (SrTiO_3) films were synthesized with mirror-confinement-type electron-cyclotron-resonance (ECR) plasma sputtering in a low-pressure Ar gas. The ion flux was found to be controlled by the microwave, while the sputtered particle flux was varied widely by the RF power supply to SrTiO_3 target. All as-deposited films were found to be amorphous phases by X-ray diffraction (XRD), and they were crystallized by post-annealing at a temperature of 400℃ which is about 200℃ lower than the one by conventional RF magnetron sputtering. While post-annealing using 28GHz millimeter-wave radiation favorably decreased the crystallization temperature further to a value of 300℃.
- 大阪大学の論文
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