Improvement of SiO_2/4H-SiC Interface Using High-Temperature Hydrogen Annealing at Low Pressure and Vacuum Annealing
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-04-30
著者
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SEKIGAWA Toshihiro
Electrotechnical Laboratory
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Yoshikawa M
Department Of Electronics University Of Osaka Prefecture
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Fukuda K
Electrotechnical Lab. Ibaraki Jpn
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YOSHIKAWA Masayuki
Plasma Research Center, University of Tsukuba
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Yoshikawa Masanobu
Department Of Applied Physics Faculty Of Engineering Osaka University
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YOSHIKAWA Masahito
Japan Atomic Energy Research Institute, Takasaki Radiation Chemistry Research Establishment
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YOSHIDA Sadafumi
Electrotechnical Laboratory
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NAGAI Kiyoko
Electrotechnical Laboratory
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Yoshikawa Masaaki
Imra Material R & D Co Ltd.
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Sekigawa Toshihiro
Electron Devices Division Electrotechnical Laboratory
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Sekigawa Toshihiro
Electroinformatics Group Nanoelectronics Research Institute National Institute Of Advanced Industria
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Yoshikawa Masahito
Japan Atomic Energy Research Institute
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FUKUDA Kenji
Electrotechnical Laboratory
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ARAI Kazuo
Electrotechnical Laboratory
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Arai K
Electrotechnical Laboratory
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Yoshikawa M
Choshu Ind. Co. Ltd. Yamaguchi Jpn
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Yoshida S
The Second Department Of Internal Medicine Chiba University School Of Medicine
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Nagai Kiyoko
Electrotechnical Lab.
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Fukuda Kuniya
Department Of Engineering Physics Faculty Of Engineering Kyoto University
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Sekigawa T
Electron Devices Division Electrotechnical Laboratory
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Yoshida S
Sharp Corp. Nara Jpn
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Yoshikawa Manabu
Department Of Physics Faculty Of Science Yamaguchi University
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