High-Temperature Operation of Silicon Carbide MOSFET
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1987-02-20
著者
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Daimon Hiroshi
Graduate School Of Material Science Nara Advanced Institute Of Science And Technology
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Daimon Hiroshi
Electrotechnical Laboratory
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Daimon Hiroshi
Department Of Material Physics Faculty O Engineering Science Osaka University
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HAYASHI Yutaka
Electrotechnical Laboratory
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Hayashi Y
Research Laboratory Of Resources Utilization Tokyo Institute Of Technology
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Ishii K
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Kondo Y
Daido Inst. Technol. Nagoya Jpn
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YOSHIDA Sadafumi
Electrotechnical Laboratory
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YAMANAKA Mitsugu
Electrotechnical Laboratory
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SAKUMA Eiichiro
Electrotechnical Laboratory
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MISAWA Shunji
Electrotechnical Laboratory
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KONDO Yasushi
Electrotechnical Laboratory
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TAKAHASHI Tetsuo
Electrotechnical Laboratory
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Yoshida S
The Second Department Of Internal Medicine Chiba University School Of Medicine
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Misawa S
Tsukuba Institute For Super Materials Ulvac Japan Ltd.
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Ishii Ken'ichi
Electrotechnical Laboratory
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Hayashi Y
Univ. Tsukuba Ibaraki Jpn
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Yamanaka M
Electron Devices Division Electrotechnical Laboratory
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Kondo Yoshitaka
Department Of Electrical Engineering Toyota Technical College
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Yoshida S
Sharp Corp. Nara Jpn
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