Sub-5μm Thin Film Crystalline Silicon Solar Cell on Alumina Ceramic Substrate
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概要
- 論文の詳細を見る
Thin film crystalline silicon with the thickness of 3-5 μm was formed on a low-cost alumina ceramic substrate using the laser-beam melt and crystallization (LMC) technique. In the LMC process, buffer layers were introduced between the thin film crystalline silicon and the alumina ceramic substrate to enlarge grain sizes, to reduce stress and to prevent unwanted impurity contamination from the substrate. Thin film crystalline silicon solar cells were experimentally fabricated, and one of them showed a conversion efficiency of 5.9%, short-circuit current of 23.3 mA/cm^2 and open-circuit voltage of 0.48 V for the silicon film thickness of 4.2 μm.
- 社団法人応用物理学会の論文
- 1993-06-01
著者
-
ISHII Kenichi
Electrotechnical Laboratory
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HAYASHI Yutaka
Electrotechnical Laboratory
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TAKAHASHI Tetsuo
Electrotechnical Laboratory
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Nishikawa Hideshi
Electrotechnical Laboratory
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