Pattern Laser Annealing by a Pulsed Laser

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概要

• 論文の詳細を見る

• Preliminary experiments with contact-type pattern laser annealing were made for local polycrystallization of a-Si, local evaporation of a-Si and local formation of Ni-Si alloy. These experiments showed that the mask patterns can be replicated as armealed regions with a resolution of a few microns on substrates. To overcome shortcomings due to the contact type pattern annealing, a projection type reduction pattern laser annealing system is proposed for resistless low temperature pattern forming processes.

• 社団法人応用物理学会の論文
• 1981-10-05

著者

• TAKAHASHI Tetsuo

  Electrotechnical Laboratory

• Hoh Koichiro

  Electrotechnical Laboratory

• Tarui Yasuo

  Electrotechnical Lab.

• MURAKAMI Koichi

  Electrical Engineering Tohoku University

• KOMIYA Yoshio

  Electrotechnical Lab.

• Takahashi Tetsuo

  Electrotechnical Laboratory:electronic Laboratory Nissan Motors Corp.

• Murakami Koichi

  Electrotechnical Laboratory

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