Incorporation of Oxygen into Silicon during Pulsed-Laser Irradiation

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1980-07-05

著者

• Miura Yoshio

  Cooperative Laboratories Vlsi Technology Research Association

• Uda Keiichiro

  Cooperative Laboratories Vlsi Technology Research Association

• Hoh Koichiro

  Electrotechnical Laboratory

• KOYAMA Hiroshi

  Cooperative Laboratories, VLSI Technology Research Association

• Koyama Hiroshi

  Cooperative Laboratories Vlsi Technology Research Association

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• Stationary Large Area Exposure in Synchrotron Radiation Lithography Utilizing a New Arrangement of Magnets Applied to the Storage Ring
• Incorporation of Oxygen into Silicon during Pulsed-Laser Irradiation
• Mass- and Electron-Spectroscopic Observation of Resist Decomposition by Synchrotron Radiation
• Lithography Experiments Using Synchrotron Radiation from ETL Storage Ring : LATE NEWS
• Thermal Analysis and Experimental Evaluation of Melting Threshold Energy of Si Thin Film Structure in Laser Annealing
• Pattern Laser Annealing by a Pulsed Laser
• Photoacoustic Effect in Laser Annealing : Physical Acoustics II
• Coherent Operation of Sliding Wiggler for Stationary Large Area Exposure in Synchrotron Radiation Lithography
• Lithography Experiments using Synchrotron Radiation from ETL Storage Ring

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