Lithography Experiments Using Synchrotron Radiation from ETL Storage Ring : LATE NEWS
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1983-02-28
著者
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Atoda Nobufumi
Electrotechnical Laboratory
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Onuki Hideo
Electrotechnical Laboratory
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ICHIMURA Shingo
Electrotechnical Laboratory, Umezono
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TANINO Hiroshi
Electrotechnical Laboratory
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Ichimura Shingo
Electrotechnical Laboratory
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Hoh Koichiro
Electrotechnical Laboratory
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HIRATA Masahiro
Electrotechnical Laboratory
関連論文
- Absorption Spectra of the Outermost 5d Core-Levels in Lead and Bismuth
- Ultraviolet Photoemission Study of Perovskite Fluorides KMF_3(M: Mn, Fe, Co, Ni, Cu, Zn) in the Valence Band Region
- X-Ray Photoemission Study of the Band Structure of KMF_3 (M: Mn, Fe, Co, Ni, Cu, Zn) Crystals
- Multiplet Structures in XPS Spectra of 3p and 3s Subshells of Magnetic Ions in Perovskite Fluorides
- Sensitivity of Ion-Imaging Method and Mass Analysis using an Imaging Detector
- Direct Estimation of the Ionization Region for XHV Measurement by Laser Ionization
- Pressure Measurement by Photoelectron Counting
- Pressure Measurement in XHV Region Using Nonresonant Multiphoton Ionization by Picosecond Pulsed Laser
- Excimer Laser Ablation of Cryogenic NO_2 Films
- Preliminary Pressure Measurement in the Range of 10^ Pa Using a Picosecond Pulsed Laser
- Nonresonant Multiphoton Ionization of H_2, CO and CO_2 by Second Harmonics of Picosecond YAG Laser
- Measurement of Extreme-High-Vacuum Pressure by Laser Ionization
- Multiphoton Ionization of Xe and Kr Atoms by an ArF Excimer Laser
- A New Ion Counting System Devised for Mass-Selective Detection of Sputtered Neutrals in Laser SNMS
- Nonresonant Multiphoton Ionization of He and Ne Atoms
- Dependence of the Nonresonant Laser Ionization of Rare Gases on Laser Wavelength
- Detection of Sputtered Neutral Atoms by Nonresonant Multiphoton Ionization : Surfaces, Interfaces and Films
- Preliminary Results of Vacuum Pressure Measurement by Laser Ionization Method
- X-Ray Study of Compressibilities of β-(BEDT-TTF)_2I_3 under Hydrostatic Pressure
- The Resistivity Measurements of HgBa_2Ca_2Cu_3O_ and HgBa_2Ca_3Cu_4O_ Superconductors under High Pressure
- Annealing Behavior of Irradiation-Induced Damagein an AlGaAs/GaAs Heterostructure by Low-Ertergy Electron Beam
- Search for asymmetric reaction of amino acids by circularly polarized radiationusing a polarizing undulator at theElectrotechnical Laboratory
- Selective Coordination Epilaxy of Transition Metal Coordination Compounds III. : Evidence of Epitaxial Growth by Buerger Precession Method
- Approach to Superlattice of Transition Metal Coordination Compounds by Selective Coordinating Epitaxy
- Selective Coordination Epitaxial Growth of Quasi-One-Dimensional Transition Metal Coordination Compounds
- A Method to Compensate Decay of Power in SR Lithography : Lithography Technology
- Laser Etching of Bi-Sr-Ca-Cu-O Superconducting Thin Films
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- Application of STM Nanometer-Size Oxidation Process to Planar-Type MIM Diode
- Comparison of the Counting Efficiencies of an Imaging Counter and Electric-pulse Counter
- Preliminary Measurement of H_2 Pressure through Detection of Photoelectrons in Vacuum Range from 10^ to 10^ Pa
- Large Area Exposure in Synchrotron Radiation Lithography Utilizing the Steering of the Electron Beam in the Storage Ring
- Effects of Electron Irradiation on Two-Dimensional Electron Gas in AlGaAs/GaAs Heterostructure
- Thickness Dependence of Photoacoustic Spectra in High-Resistivity GaAS : Physical Acoustics II
- Focused Ion Beam Fabrication of Fine Metal Structures by Oxide Resists : Beam-Induced Physics and Chemistry
- Focused Ion Beam Fabrication of Fine Metal Structures by Oxide Resists
- Synergistic Enhancement of Direct Synchrotron Radiation Etching of a Resist by a Low-Energy Oxygen Beam
- Pressure Dependence of Absorption Edge,Luminescence Peak and Raman Frequency in Wolffram's Red Salt
- Stationary Large Area Exposure in Synchrotron Radiation Lithography Utilizing a New Arrangement of Magnets Applied to the Storage Ring
- X-Ray Photoelectron Spectroscopy (XPS) Analysis of Oxide Formation on Silicon with High-Purity Ozone
- Incorporation of Oxygen into Silicon during Pulsed-Laser Irradiation
- Mass- and Electron-Spectroscopic Observation of Resist Decomposition by Synchrotron Radiation
- Lithography Experiments Using Synchrotron Radiation from ETL Storage Ring : LATE NEWS
- Photoabsorption Spectra of Si(CH_3O)_4, Si(CH_3O)_2(C_6H_5)_2, Si(C_2H_5O)_4, Ti(i-C_3H_7O), and BCl_3 in the Region of 6-9.6 eV
- Spectral Flux Measurements of Synchrotron Radiation from the INS Machine in the Visible Region
- Absolute Photon-Flux and Angular Distribution of the Tokyo Synchrotron Radiation in the Vacuum Ultraviolet
- Observation of Strong Magnetic Circular Dichroism of 'Nonmagnetic' Y^ Core Transition in Ferrimagnetic YIG Lattice
- Microscopic Imaging of Circular Dichroism Using a Polarizing Undulator
- Photoelectric Yield Spectra of Perovskite Fluorides; KMnF_3 and KZnF_3
- XUV Absorption Spectra of Sb Metal and BiSb Alloys : X-RAY AND XUV ABSORPTION SPECTRA
- Focused Ion Beam Lithography with Transition Metal Oxide Resists : Lithography Technology
- A New Method for Cleaning the Surface of Ultra High-Purity Iron by High-Purity Ozone Exposure and UV Irradiation
- Initial Oxidation of Si(100)2×1 by Ozone : Transition of Growth Kinetics from Adsorption to Ultrathin Film Growth
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- Observation of Surface by Surface Electron Spectroscopic Tomography
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- Highly Sensitive Raman Spectroscopy by a Position-Sensitive Photomultiplier and a Triple-Stage Spectrograph with Stigmatic Optical Correction
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- Summary Abstract
- A Method to Compensate Decay of Power in SR Lithography
- Lithography Experiments using Synchrotron Radiation from ETL Storage Ring