Synergistic Enhancement of Direct Synchrotron Radiation Etching of a Resist by a Low-Energy Oxygen Beam
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1987-11-20
著者
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Kudo Isao
Electrotechnical Laboratory
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Atoda N
Electrotechnical Lab. Ibaraki
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Atoda Nobufumi
Electrotechnical Laboratory
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ICHIMURA Shingo
Electrotechnical Laboratory, Umezono
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SHIMIZU Hazime
Electrotechnical Laboratory, Umezono
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MURAKAMI Hiroshi
Electrotechnical Laboratory
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Ichimura Shingo
Electrotechnical Laboratory
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Shimizu Hazime
Electrotechnical Laboratory
関連論文
- Depletion of Copper from the Grain Boundary Region of Copper-Nickel Alloys during Sputtering at Elevated Temperatures
- Sensitivity of Ion-Imaging Method and Mass Analysis using an Imaging Detector
- Direct Estimation of the Ionization Region for XHV Measurement by Laser Ionization
- Pressure Measurement by Photoelectron Counting
- Pressure Measurement in XHV Region Using Nonresonant Multiphoton Ionization by Picosecond Pulsed Laser
- Excimer Laser Ablation of Cryogenic NO_2 Films
- Preliminary Pressure Measurement in the Range of 10^ Pa Using a Picosecond Pulsed Laser
- Nonresonant Multiphoton Ionization of H_2, CO and CO_2 by Second Harmonics of Picosecond YAG Laser
- Measurement of Extreme-High-Vacuum Pressure by Laser Ionization
- Multiphoton Ionization of Xe and Kr Atoms by an ArF Excimer Laser
- A New Ion Counting System Devised for Mass-Selective Detection of Sputtered Neutrals in Laser SNMS
- Nonresonant Multiphoton Ionization of He and Ne Atoms
- Dependence of the Nonresonant Laser Ionization of Rare Gases on Laser Wavelength
- Detection of Sputtered Neutral Atoms by Nonresonant Multiphoton Ionization : Surfaces, Interfaces and Films
- Preliminary Results of Vacuum Pressure Measurement by Laser Ionization Method
- Nonlinear Optical Properties of Si(111)7×7 : Intensity Behavior of Second Harmonies from the Polarizations along [21^^-1^^-] and [011^^-] Axes
- Annealing Behavior of Irradiation-Induced Damagein an AlGaAs/GaAs Heterostructure by Low-Ertergy Electron Beam
- Effect of Atomic Force on the Surface Corrugation of 2H-NbSe_2 Observed by Scanning Tunneling Microscopy
- Observation of Atomic Image of 2H-NbSe_2 Surface by Scanning Tunneling Microscope
- A Method to Compensate Decay of Power in SR Lithography : Lithography Technology
- Laser Etching of Bi-Sr-Ca-Cu-O Superconducting Thin Films
- Hyperthermal O_3 Beam Produced by Laser Ablation of Solid-Ozone Film
- Application of STM Nanometer-Size Oxidation Process to Planar-Type MIM Diode
- Comparison of the Counting Efficiencies of an Imaging Counter and Electric-pulse Counter
- Preliminary Measurement of H_2 Pressure through Detection of Photoelectrons in Vacuum Range from 10^ to 10^ Pa
- Large Area Exposure in Synchrotron Radiation Lithography Utilizing the Steering of the Electron Beam in the Storage Ring
- Gold Substrates for Scanning Tunneling Microscopy of Adsorbed Species
- Effects of Electron Irradiation on Two-Dimensional Electron Gas in AlGaAs/GaAs Heterostructure
- Focused Ion Beam Fabrication of Fine Metal Structures by Oxide Resists : Beam-Induced Physics and Chemistry
- Control of Levitation in Electromagnetic Levitators under Microgravity
- Focused Ion Beam Fabrication of Fine Metal Structures by Oxide Resists
- Synergistic Enhancement of Direct Synchrotron Radiation Etching of a Resist by a Low-Energy Oxygen Beam
- X-Ray Photoelectron Spectroscopy (XPS) Analysis of Oxide Formation on Silicon with High-Purity Ozone
- Mass- and Electron-Spectroscopic Observation of Resist Decomposition by Synchrotron Radiation
- Lithography Experiments Using Synchrotron Radiation from ETL Storage Ring : LATE NEWS
- SEPAC System Test in NASDA Space Chamber
- SEPAC System Test in NASDA Space Chamber
- Diagnostic Studies of SEPAC Test in NASDA Space Chamber
- SEPAC Particle Accelerator Test in NASDA Space Chamber
- Focused Ion Beam Lithography with Transition Metal Oxide Resists : Lithography Technology
- A New Method for Cleaning the Surface of Ultra High-Purity Iron by High-Purity Ozone Exposure and UV Irradiation
- Micro-probe Auger Analysis of Si Migration in Al Metallization for LSI : A-3: DEVICE TECHNOLOGY (III)
- Dose Rate Effect of the Preferential Sputtering of Copper-Nickel Alloys by Argon Ion at Elevated Temperatures
- Simultaneous Control Experiment of Orientation and Arm Position of Space Robot Using Drop Shaft
- Initial Oxidation of Si(100)2×1 by Ozone : Transition of Growth Kinetics from Adsorption to Ultrathin Film Growth
- Effect of Optical Breakdown on Second Harmonic Generation from Si(111)7×7 with Nd:YAG Laser
- Adsorption of Benzene on Si(111)7×7 at Room Temperature Observed by Second Harmonic Generation (SHG)
- Observation of Surface by Surface Electron Spectroscopic Tomography
- Focused Ion Beam Lithography with Transition Metal Oxide Resists
- Summary Abstract
- A Method to Compensate Decay of Power in SR Lithography
- Lithography Experiments using Synchrotron Radiation from ETL Storage Ring