Mass- and Electron-Spectroscopic Observation of Resist Decomposition by Synchrotron Radiation
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概要
- 論文の詳細を見る
Analytical techniques of mass- and electron-spectroscopy were applied to the observation of lithography by synchrotron radiation (SR). During the exposure of positive resist to SR, the tendency of side-chain components easily dissociating was shown by mass spectroscopy. In-situ analysis with electron spectroscopy showed that the height of a peak appearing at low energy increased during the exposure when the power density of SR was high. This increase was closely related to the reduction in the film thickness by SR due to the dissociation of constituent molecules of the resist.
- 社団法人応用物理学会の論文
- 1983-07-20
著者
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Ono Masatoshi
Electrotechnical Laboratory
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Atoda Nobufumi
Electrotechnical Laboratory
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ICHIMURA Shingo
Electrotechnical Laboratory, Umezono
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TANINO Hiroshi
Electrotechnical Laboratory
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Ichimura Shingo
Electrotechnical Laboratory
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Hoh Koichiro
Electrotechnical Laboratory
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HIRATA Masahiro
Electrotechnical Laboratory
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