Sakamoto Kunihiro | Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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概要
- SAKAMOTO Kunihiroの詳細を見る
- 同名の論文著者
- Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology の論文著者
関連著者
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Sakamoto Kunihiro
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Masahara Meishoku
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Matsukawa Takashi
Nanoelectronics Research Institute Aist
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Liu Yongxun
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Endo Kazuhiko
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology (aist)
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Ishikawa Yuki
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Yamauchi Hiromi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Tsukada Junichi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Sekigawa Toshihiro
Nanoelectronices Research Institute National Institute Of Advanced Science And Technology (aist)
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Suzuki Eiichi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Suzuki Eiichi
Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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ENDO Kazuhiko
National Institute of Advanced Industrial Science and Technology
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MASAHARA Meishoku
National Institute of Advanced Industrial Science and Technology
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Koike Hanpei
Nanoelectronices Research Institute National Institute Of Advanced Science And Technology (aist)
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Liu Yongxun
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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O'uchi Shin-ichi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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ENDO Kazuhiko
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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SAKAMOTO Kunihiro
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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Sekigawa Toshihiro
Electroinformatics Group Nanoelectronics Research Institute National Institute Of Advanced Industria
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Koike Hanpei
Electroinformatics Group Nanoelectronics Research Institute National Institute Of Advanced Industria
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Ishii Kenichi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology (aist)
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Ishii Kenichi
Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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MASAHARA Meishoku
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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Maeda T
Advanced Industrial Sci. And Technol. Ibaraki Jpn
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MATSUKAWA Takashi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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SUZUKI Eiichi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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Kanemaru Seigo
Nanoelectronics Research Institute Aist
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Suzuki E
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Nakagawa Tadashi
Electroinformatics Group Nanoelectronics Research Institute National Institute Of Advanced Industria
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Tanoue Hisao
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Matsukawa Takashi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Nakagawa Tadashi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology (aist)
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Masahara Meishoku
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Liu Yongxun
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Matsuhata H
Aist Tsukuba Jpn
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Matsuhata Hirofumi
Division Of Electron Devices Electrotechnical Laboratory
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LIU Yongxum
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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TSUKADA Junichi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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ISHII Kenichi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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YAMAUCHI Hiromi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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MATSUHATA Hirofumi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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MIKI Kazushi
Research Center for Advanced Carbon Materials and Nanotechnology Research Institute National Institu
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MIKI Kazushi
Nanotechnology Research Institute-AIST
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Matsuhata H
Toyota Technological Institute:(present Address)electrotechnical Laboratory
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Matsuhata Hirofumi
Nanoelectronics Research Institute Aist
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Ishii K
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Ishikuro Hiroki
Keio Univ. Yokohama‐shi Jpn
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Sakamoto K
Tohoku Univ. Miyagi Jpn
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LIU Yongxun
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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MIKI Kazushi
Electrotechnical Laboratory (ETL)
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SEKIGAWA Toshihiro
Nanoelectronices Research Institute, National Institute of Advanced Science and Technology (AIST)
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KOIKE Hanpei
Nanoelectronices Research Institute, National Institute of Advanced Science and Technology (AIST)
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MIKI Kazushi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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Sakamoto Kunihiro
Electrotechnical Laboratory (etl)
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Hosokawa Shinichi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Yamauchi Hiroshi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Miki K
Electrotechnical Laboratory (etl)
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Miki Kazushi
National Institute Of Materials Science (nims)
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Miki Kazushi
Aist
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Miki Kazushi
Nanoarchitecture Group Organic Nanomaterials Center National Institute For Materials Science
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Sakamoto Kenji
Institute Of Fluid Science Tohoku University
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Sakai Hideo
Keio University
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MATSUKAWA Takashi
AIST
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ENDO Kazuhiko
AIST
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LIU Yongxun
AIST
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TSUKADA Junichi
AIST
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ISHIKAWA Yuki
AIST
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NAKAGAWA Tadashi
AIST
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SEKIGAWA Toshihiro
AIST
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KOIKE Hanpei
AIST
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SAKAMOTO Kunihiro
AIST
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MASAHARA Meishoku
AIST
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TSUKADA Junichi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)
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Yamauchi Hiromi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Sakamoto Kunihiro
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Sakamoto Kunihiro
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Liu Yongxun
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Matsukawa Takashi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Matsukawa Takashi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Hosokawa Shinichi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Nakagawa Tadashi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)
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Ishii Kenichi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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KOIKE Hanpei
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)
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SEKIGAWA Toshihiro
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)
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Sekigawa Toshihiro
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Kanemaru Seigo
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Kanemaru Seigo
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Masahara Meishoku
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
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Matsukawa Takashi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
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Endo Kazuhiko
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
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Yamauchi Hiromi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
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Tsukada Junichi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
著作論文
- Enhancing Noise Margins of Fin-Type Field Effect Transistor Static Random Access Memory Cell by Using Threshold Voltage-Controllable Flexible-Pass-Gates
- FinFET-Based Flex-Vth SRAM Design for Drastic Standby-Leakage-Current Reduction
- Behaviors of surfactant atoms on Si(001) surface
- Novel Process for Vertical Double-Gate (DG) Metal-Oxide-Semiconductor Field-Effect-Transistor (MOSFET) Fabrication
- A 0.7-V Opamp in Scaled Low-Standby-Power FinFET Technology
- High-Frequency Precise Characterization of Intrinsic FinFET Channel
- A 0.7-V Opamp in Scaled Low-Standby-Power FinFET Technology
- Device Design Consideration for $V_{\text{th}}$-Controllable Four-Terminal Double-Gate Metal-Oxide-Semiconductor Field-Effect Transistor
- P-Channel Vertical Double-Gate MOSFET Fabricated by Utilizing Ion-Bombardment-Retarded Etching Processs
- Atomic Layer Deposition of SiO
- Atomic Layer Deposition of SiO₂ for the Performance Enhancement of Fin Field Effect Transistors