Sakata Isao | Electron Devices Division Electrotechnical Laboratory
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概要
関連著者
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Sakata Isao
Electron Devices Division Electrotechnical Laboratory
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Sakata I
National Inst. Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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Yamanaka M
Electron Devices Division Electrotechnical Laboratory
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Sakata Isao
Device Synthesis Section Electrotechnical Laboratory
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林 康明
京都工芸繊維大学大学院
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林康 明
京都工芸繊維大学工芸学部電子情報工学科
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林 康明
京都工芸繊維大学大学院工芸科学研究科
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Hayashi Yuzo
Irie Koken Co. Ltd.
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YAMANAKA Mitsuyuki
Device Synthesis Section, Electrotechnical Laboratory
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Hayashi Yutaka
Device Synthesis Section Electrotechnical Laboratory
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YAMANAKA Mitsuyuki
Electron Devices Division, Electrotechnical Laboratory
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SAKATA Isao
Semiconductor Device Section, Electrotechnical Laboratory
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HAYASHI Yutaka
Semiconductor Device Section, Electrotechnical Laboratory
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YAMANAKA Mitsuyuki
Semiconductor Device Section, Electrotechnical Laboratory
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HAZRA Sukti
Electron Devices Division, Electrotechnical Laboratory
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SUZUKI Eiichi
Electron Devices Division, Electrotechnical Laboratory
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OKAZAKI Shoji
Department of Electronic Engineering, Faculty of Engineering, Osaka University
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Suzuki E
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Sekigawa Toshihiro
Electron Devices Division Electrotechnical Laboratory
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Sakata Isao
Electrotechnical Laboratory
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Hazra S
Electron Devices Division Electrotechnical Laboratory
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Okazaki S
Osaka Univ. Osaka Jpn
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Sekigawa T
Electron Devices Division Electrotechnical Laboratory
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Yamanaka Mitsuyuki
Semiconductor Device Section Electrotechnical Laboratory
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Hayashi Yutaka
Semiconductor Device Section Electrotechnical Laboratory
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HAYASHI Yutaka
Electrotechnical Laboratory
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SEKIGAWA Toshihiro
Electrotechnical Laboratory
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MATSUDA Akihisa
Electrotechnical Laboratory
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Ganguly Gautam
Electrotechnical Laboratory
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Yamada Koichi
Department of Medicine, Kansai Medical University Kouri Hospital
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Ihara Manabu
Department Of Chemical Engineering The University Fo Tokyo
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Ihara Manabu
Department Of Chemical System Engineering School Of Engineering University Of Tokyo
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Maeda T
Advanced Industrial Sci. And Technol. Ibaraki Jpn
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Maeda T
Central Research Laboratory Hitachi Ltd.
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NUMASE Shoji
Device Synthesis Section, Electrotechnical Laboratory
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ISHIDA Takeshige
Device Synthesis Section, Electrotechnical Laboratory
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OKAZAKI Satoru
Device Synthesis Section, Electrotechnical Laboratory
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ISHII Ken-ichi
Semiconductor Device Section, Electrotechnical Laboratory
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TAKAHASHI Tetsuo
Semiconductor Device Section, Electrotechnical Laboratory
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OKAZAKI Satoru
Semiconductor Device Section, Electrotechnical Laboratory
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SEKIGAWA Toshihiro
Device Synthesis Section, Electrotechnical Laboratory
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TSUTSUMI Toshiyuki
Electron Devices Division, Electrotechnical Laboratory
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MAEDA Tatsuro
Electron Devices Division, Electrotechnical Laboratory
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Maeda T
Electron Devices Division Electrotechnical Laboratory
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Yamada Koichi
Department Of Chemical System Engineering School Of Engineering University Of Tokyo
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Yamada Koichi
Department Of Agricultural Chemistry The University Of Tokyo
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Sekigawa Toshihiro
Electroinformatics Group Nanoelectronics Research Institute National Institute Of Advanced Industria
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Wen C‐j
Univ. Tokyo Tokyo Jpn
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Wen Ching-ju
Department Of Chemical Engineering Graduate School Of Engineering The University Of Tokyo
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Numase Shoji
Device Synthesis Section Electrotechnical Laboratory
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Ishii Ken-ichi
Semiconductor Device Section Electrotechnical Laboratory
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OKUSHI Hideo
Electrotechnical Laboratory
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OKAJIMA Keiichi
Department of Chemical System Engineering, School of Engineering, University of Tokyo
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WIN Ching-ju
Department of Chemical System Engineering, School of Engineering, University of Tokyo
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Win Ching-ju
Department Of Chemical System Engineering School Of Engineering University Of Tokyo
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Okajima Keiichi
Department Of Chemical System Engineering School Of Engineering University Of Tokyo:(present Address
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Sakata I
Electrotechnical Laboratory
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Ishida Takeshige
Device Synthesis Section Electrotechnical Laboratory
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Tsutsumi Toshiyuki
Electroinformatics Group Nanoelectronics Research Institute National Institute Of Advanced Industria
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Takahashi Tetsuo
Semiconductor Device Section Electrotechnical Laboratory
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Tsutsumi Toshiyuki
National Institute of Advanced Industrial Science and Technology:Meiyi University
著作論文
- In Situ Hydrogenation of Amorphous Silicon Prepared by Thermal Decomposition of Disilane
- Light-Induced Changes in Plasma-Deposited Hydrogenated Amorphous Silicon Prepared under Visible-Light Illumination Studied by a Constant Photocurrent Method
- Constant-Photocurrent-Method (CPM) Studies on Light-Induced Changes in Hydrogenated Amorphous Silicon
- Origin of the Reduction of Light-Induced Changes in Plasma-Deposited Hydrogenated Amorphous Silicon Prepared under Visible-Light Illumination
- Effect of Visible-Light Illumination on the Growing Surface of an a-Si:H Film in Plasma Decomposition of SiH_4
- Re-Examination of Carrier Trapping Models for Light-Induced Changes in Hydrogenated Amorphous Silicon
- Minority Carrier Lifetime in Laser Recrystallized Polysilicon
- Raman Scattering Studies on Hydrogenated Amorphous Silicon Prepared under High Deposition Rate Conditions
- Effects of Film Quality of Hydrogenated Amorphous Silicon Grown by Thermal Chemical-Vapor-Deposition on Subsequent in-situ Hydrogenation Processes
- Relationship between Carrier Diffusion Length and Light-Induced Defects in Hydrogenated Amorphous Silicon
- Spectroscopic Ellipsometry Studies on Ultrathin Hydrogenated Amorphous Silicon Films Prepared by Thermal Chemical Vapor Deposition
- Spectroscopic Ellipsometry for the Identification of Paracrystallites in the Ultra-Thin Thermal CVD Hydrogenated Amorphous Silicon Films
- Absence of Correlation between Disorder and Defect Density in Hydrogenated Amorphous Silicon
- Optical and Electrical Properties of β-FeSi_2/Si, β-FeSi_2/InP Heterojunction Prepared by RF-Sputtering Deposition
- Simple Analytical Methods for Determining Optical Constants of Thin Films : Their Application to Amorphous Silicon