Hazra S | Electron Devices Division Electrotechnical Laboratory
スポンサーリンク
概要
関連著者
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HAZRA Sukti
Electron Devices Division, Electrotechnical Laboratory
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Hazra S
Electron Devices Division Electrotechnical Laboratory
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Sakata I
National Inst. Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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Sakata Isao
Electron Devices Division Electrotechnical Laboratory
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YAMANAKA Mitsuyuki
Electron Devices Division, Electrotechnical Laboratory
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SUZUKI Eiichi
Electron Devices Division, Electrotechnical Laboratory
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Suzuki E
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Yamanaka M
Electron Devices Division Electrotechnical Laboratory
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Middya A
Energy Research Unit Indian Association For The Cultivation Of Science
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Middya Abdul
Energy Research Unit Indian Association For The Cultivation Of Science
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Maeda T
Advanced Industrial Sci. And Technol. Ibaraki Jpn
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Maeda T
Central Research Laboratory Hitachi Ltd.
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RAY Swati
Energy Research Unit, Indian Association for the Cultivation of Science
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TSUTSUMI Toshiyuki
Electron Devices Division, Electrotechnical Laboratory
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MAEDA Tatsuro
Electron Devices Division, Electrotechnical Laboratory
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Maeda T
Electron Devices Division Electrotechnical Laboratory
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Ray Swati
Energy Research Unit Indian Association For The Cultivation Of Science
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Hazra Sukti
Energy Research Unit Indian Association For The Cultivation Of Science
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RATH Jatindra
Energy Research Unit, Indian Association for the Cultivation of Science
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BASAK Subhashis
Energy Research Unit, Indian Association for the Cultivation of Science
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Tsutsumi Toshiyuki
Electroinformatics Group Nanoelectronics Research Institute National Institute Of Advanced Industria
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Rath Jatindra
Energy Research Unit Indian Association For The Cultivation Of Science
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Basak Subhashis
Energy Research Unit Indian Association For The Cultivation Of Science
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Tsutsumi Toshiyuki
National Institute of Advanced Industrial Science and Technology:Meiyi University
著作論文
- Spectroscopic Ellipsometry Studies on Ultrathin Hydrogenated Amorphous Silicon Films Prepared by Thermal Chemical Vapor Deposition
- Spectroscopic Ellipsometry for the Identification of Paracrystallites in the Ultra-Thin Thermal CVD Hydrogenated Amorphous Silicon Films
- Development of High Quality 1.36 eV Amorphous SiGe:H Alloy by RF Glow Discharge under Helium Dilution