Spectroscopic Ellipsometry Studies on Ultrathin Hydrogenated Amorphous Silicon Films Prepared by Thermal Chemical Vapor Deposition

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2000-11-15

著者

• Maeda T

  Advanced Industrial Sci. And Technol. Ibaraki Jpn

• Maeda T

  Central Research Laboratory Hitachi Ltd.

• Sakata I

  National Inst. Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn

• Sakata Isao

  Electron Devices Division Electrotechnical Laboratory

• YAMANAKA Mitsuyuki

  Electron Devices Division, Electrotechnical Laboratory

• HAZRA Sukti

  Electron Devices Division, Electrotechnical Laboratory

• TSUTSUMI Toshiyuki

  Electron Devices Division, Electrotechnical Laboratory

• MAEDA Tatsuro

  Electron Devices Division, Electrotechnical Laboratory

• SUZUKI Eiichi

  Electron Devices Division, Electrotechnical Laboratory

• Maeda T

  Electron Devices Division Electrotechnical Laboratory

• Suzuki E

  Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology

• Hazra S

  Electron Devices Division Electrotechnical Laboratory

• Yamanaka M

  Electron Devices Division Electrotechnical Laboratory

• Tsutsumi Toshiyuki

  Electroinformatics Group Nanoelectronics Research Institute National Institute Of Advanced Industria

• Tsutsumi Toshiyuki

  National Institute of Advanced Industrial Science and Technology:Meiyi University

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