Asano Tanemasa | Graduate School Of Information Science And Electrical Engineering Kyushu University
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- Graduate School Of Information Science And Electrical Engineering Kyushu Universityの論文著者
関連著者
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Asano Tanemasa
Graduate School Of Information Science And Electrical Engineering Kyushu University
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ISHIWARA Hiroshi
Graduate School of Science
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ASANO Tanemasa
Graduate School of Information Science and Electrical Engineering, Kyushu University
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Asano Tanemasa
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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FURUKAWA Seijiro
Graduate School of Science and Engineering, Tokyo Institute of technology
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Ishiwara Hiroshi
Tokyo Institute Of Technology Interdisciplinary Graduate School Of Science And Engineering
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Ishiwara Hiroshi
Precision & Intelligence Laboratory Tokyo Institute Of Technology
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Ishiwara H
Tokyo Institute Of Technology Interdisciplinary Graduate School Of Science And Engineering
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Furukawa Seijiro
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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FURUKAWA Seigo
Department of Electronics, Nippondenso Technical College
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Furukawa S
Kyushu Inst. Technology Fukuoka Jpn
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Ikeda Akihiro
Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Ishiwara Hiroshi
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Nakagawa Gou
Graduate School Of Information Science And Electrical Engineering Kyushu University
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Lee Hee
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Lee Hee
Department Of Eecs Korea Advanced Institute Of Science And Technology
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Lee Hee
Department Of Electrical Engineering And Computer Science Kaist
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Watanabe Naoya
Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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KANEMARU Seigo
Graduate School of Science and Engineering, Tokyo Institute of Technology
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TSUTSUI Kazuo
Graduate School of Science and Engineering, Tokyo Institute of Technology
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ORIHARA Kouzo
Graduate School of Science and Engineering, Tokyo Institute of Technology
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Orihara Kouzo
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Kanemaru S
Aist Ibaraki Jpn
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Kanemaru Seigo
Nanoelectronics Research Institute Aist
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Kanemaru Seigo
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Kanemaru Seigo
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Kanemaru Seigo
Tsukuba Laboratory Yaskawa Electric Co. Ltd.
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TSUTSUI Kazuo
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Tsutsui K
Sony Corp. Tokyo Jpn
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Tsutsui Kazuo
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Kajiwara Kouhei
Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Ikenoue Hiroshi
Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Nishi Koji
Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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ANDO KOJI
Department of Surgery and Science, Graduate School of Medical Sciences, Kyushu University
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Sano Eiichi
Research Center For Integrated Quantum Electronics Hokkaido University
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KOMA Atsushi
Department of Chemistry, The University of Tokyo
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SATO Yasuhiro
Department of Applied Physics, Hokkaido University
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Otsuji Taiichi
Research Institute Of Electrical Communication Tohoku University
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Otsuji Taiichi
Japan Science And Technology Agency Crest
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HANABE Mitsuhiro
Research Institute of Electrical Communication, Tohoku University
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MEZIANI Yahya
Research Institute of Electrical Communication, Tohoku University
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Meziani Yahya
Research Institute Of Electrical Communication Tohoku University
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Sano Eiichi
Hokkaido Univ. Sapporo Jpn
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SAIKI Koihiro
Department of Chemistry, The University of Tokyo
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SAITOH Shuichi
Graduate School of Science and Engineering, Tokyo Institute of Technology
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ATANASSOV Rosen
Graduate School of Science and Engineering, Tokyo Institute of Technology
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HANABE Mitsuhiro
Kyushu Institute of Technology
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Saiki Koihiro
Department Of Chemistry The University Of Tokyo
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Saitoh Shuichi
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Atanassov Rosen
Graduate School Of Science And Engineering Tokyo Institute Of Technology:(present Address) Departmen
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Hanabe Mitsuhiro
Research Institute Of Electrical Communication Tohoku University
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Sano Eiichi
Research Center For Integrated Quantum Electronics (rciqe) Hokkaido University
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Koma Atsushi
Department Of Applied Physics University Of Tokyo
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Otsuji Taiichi
Tohoku Univ. Sendai Jpn
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FUKADA Tsuyoshi
Graduate School of Science and Engineering Tokyo Institute of Technology
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FRUKAWA Seijiro
Graduate School of Science and Engineering Tokyo Institute of Technology
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HO KIM
Graduate School of Science and Engineering, Tokyo Institute of Technology
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ISHIWARA Hirohsi
Graduate School of Science and Engineering, Tokyo Institute of Technology
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KAIFU Noriyuki
Graduate School of Science and Engineering, Tokyo Institute of Technology
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Ando Koji
Department Of Applied Chemistry Muroran Institute Of Technology
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Kaifu Noriyuki
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Ishiwara Hirohsi
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Ando Koji
Department Of Chemistry The University Of Tokyo
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Sato Yasuhiro
Department Of Chemistry The University Of Tokyo
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Ando Koji
Department Of Applied Chemistry Faculty Of Science And Technology Keio University
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Ho Kim
Graduate School Of Science And Engineering Tokyo Institute Of Technology
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Otsuji Taiichi
Research Institute for Electrical Communication, Tohoku University, Sendai 980-8577, Japan
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ISHIWARA Hiroshi
Graduate School of Science and Engineering, Tokyo Institute of Technology
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Nakagawa Gou
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
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Nakagawa Gou
Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Nagata Sho
Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Shuto Takanori
Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Noda Kazuhiro
Adwelds Co., Ltd., Nakagawa, Fukuoka 811-1201, Japan
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Asano Tanemasa
Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Qiu Lijing
Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Nakai Seiya
Adwelds Co., Ltd., Nakagawa, Fukuoka 811-1201, Japan
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Asano Tanemasa
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
著作論文
- Possibility of Terahertz Injection-Locked Oscillation in an InGaP/InGaAs/GaAs Two-Dimensional Plasmon-Resonant Photomixer(Emerging Devices,Fundamentals and Applications of Advanced Semiconductor Devices)
- Electron-Beam Exposure(EBE) and Epitaxy of GaAs Films on CaF_2/Si Structures : Surfaces, Interfaces and Films
- Flattening the Surface of CaF_2/Si(100) Structures by Post-Growth Annealing : Surfaces, Interfaces and Films
- Characterization of Ultrathin CaF_2 Films Heteroepitaxially Grown on Si(111) Surfaces : Surfaces, Interfaces and Films
- Growth and Characterization of Compositionally Graded (Ca, Sr)F_2 Layers on Si(111) Substrates
- Optimization of the Growth Conditions of Heteroepitaxial GaAs Films on CaF_2/Si Structures
- Formation of GaAs-on-Insulator Structures on Si Substrates by Heteroepitaxial Growth of CaF_2 and GaAs
- Control of Crystal Orientations in Lattice-Mismatched SrF_2 and (Ca, Sr)F_2 Films on Si Substrates by Intermediate CaF_2 Films
- Epitaxial Relations in Lattice-Matched (Ca, Sr)F_2 Films Grown on GaAs{111} and Ge(111) Substrates
- Improvement of Crystalline Quality of Si Films on CaF_2/Si Structures by Ion Implantation and Solid Phase Recrystallization
- Single Crystalline Silicide Formation
- Formation of Thick, Thermally-Stable High-Resistivity-Layers in GaAs by Oxygen Ion Implantation
- Oriented Growth of Location-Controlled Si Crystal Grains Using Ni Nano-Imprint and Excimer Laser Annealing
- Effect of Argon/Hydrogen Plasma Cleaning on Electroless Ni Deposition on Small-Area Al Pads
- Formation of Ohmic Contacts to n-GaAs by Solid Phase Epitaxy of Evaporated and Ion Implanted Ge Films
- Improvement of the Interface Properties of Fluoride/GaAs(100) Structures by Postgrowth Annealing : III-V Compound Semiconductors Devices and Materials(Solid State Devices and Materials 1)
- Epitaxial Growth of Ge Films onto CaF_2/Si Structures
- Heteroepitaxial Growth of Group-IIa-Fluoride Films on Si Substrates
- Radiation Damage in Epitaxial CaF_2 Films on Si Substrates by Ar^+ Ion Implantation
- Lattice-Matched Epitaxial Growth of Semiconductor Films onto Insulator (Mixed Fluoride)/Si Structures : A-6: SILICON CRYSTALS
- Silicon Crystal Nanowires Produced by Metal-Induced Lateral Crystallization
- Impact of Rapid Crystallization of Si Using Nickel-Metal-Induced Lateral Crystallization on Thin-Film Transistor Characteristics
- Room-Temperature Microjoining of LSI Chips on Poly(ethylene naphthalate) Film Using Mechanical Caulking of Au Cone Bump
- Oriented Growth of Location-Controlled Si Crystal Grains by Ni Nano-Imprint and Excimer Laser Annealing
- Room-Temperature Cu Microjoining with Ultrasonic Bonding of Cone-Shaped Bump
- Phosphorus Doping into 4H-SiC by Irradiation of Excimer Laser in Phosphoric Solution
- Effect of argon/hydrogen plasma cleaning on electroless ni deposition on small-area al pads
- Phosphorus Doping into 4H-SiC by Irradiation of Excimer Laser in Phosphoric Solution (Special Issue : Microprocesses and Nanotechnology)