Fabrication of High-Resolution Fresnel Zone Plates by a Single Layer Resist Process

スポンサーリンク

概要

著者

関連論文

Fast Proximity Corrections for Electron-Beam-Fabricated High Resolution and High-Aspect-Ratio Fresnel Zone Plate
Nanofabrication of Fresnel Zone Plates for X-Ray Focusing
Formation of a High-Electrical-Resistance Region in InP by Ga Ion Implantation
Time-Resolved Observation of Laser-Induced Surface Reaction for Si/Cl_2 System Using Second-Harmonic Generation
Observation of Etching Reaction for Si/XeF_2 System Using Second-Harmonic Generatiorn
Microphotonic Devices Fabricated by Silicon Micromachining Techniques
Fabrication of 40-150 nm Gate Length Ultrathin n-MOSFETs Using Epitaxial Layer Transfer SOI Wafers
Fabrication of 40-150nm Gate Length Ultrathin n-MOSFETs Using ELTRAN SOI Wafers
SiO_2/c-Si Bilayer Electron-Beam Resist Process for Nano-Fabrication
SiO_2/Poly-Si Multilayered Electron Beam Resist Process for Fabrication of Ultrasmall Tunnel Junctions
Annealing Behavior of Irradiation-Induced Damagein an AlGaAs/GaAs Heterostructure by Low-Ertergy Electron Beam
Fabrication of a Nanometer-Scale Si-Wire by Micromachining of a Silicon-on-Insulator Substrate
Effects of Electron Irradiation on Two-Dimensional Electron Gas in AlGaAs/GaAs Heterostructure
Electrical Properties of Nanometer-Width Refractory Metal Lines Fabricated by Focused Ion Beam and Oxide Resists
50-nm Metal Line Fabrication by Focused Ion Beam and Oxide Resists : Focused Ion Beam Process
50-nm Metal Line Fabrication by Focused Ion Beam and Oxide Resists
Focused Ion Beam Fabrication of Fine Metal Structures by Oxide Resists : Beam-Induced Physics and Chemistry
Focused Ga Ion Beam Etching of Si in Chlorine Gas : Etching and Deposition Technology
Focused Ga Ion Beam Etching of Si in Chlorine Gas
Focused Ion Beam Fabrication of Fine Metal Structures by Oxide Resists
Fabrication of High-Resolution Fresnel Zone Plates by a Single Layer Resist Process
Fabrication of 5 nm Resolution Electrodes for Molecular Devices by Means of Electron Beam Lithography
Dual Function of Thin MoO_3 and WO_3 Films as Negative and Positive Resists for Focused Ion Beam Lithography
Imprint Characteristics by Photo-Induced Solidification of Liquid Polymer
Preparation of Diamond Mold Using Electron Beam Lithography for Application to Nanoimprint Lithography
Electron Beam Assisted Chemical Etching of Single-Crystal Diamond Substrates with Hydrogen Gas
Fundamental Characteristic of Capillary-Type Cluster Ion Source and Its Application for Selective Deposition of Aluminum Film : Etching and Deposition Technology
Fundamental Characteristics of Capillary-Type Cluster Ion Source and Its Application for Selective Deposition of Aluminum Film
Lateral Solid-Phase Epitaxy of Si Induced by Focused Ion Beams
Electrorn-Beam Study of Nanometer Performances of the SAL 601 Chemically Amplified Resist
Conditions for Fabrication of Highly Conductive Wires by Electron-Beam-Induced Deposition
Broad-Pulsed Ga Ion-Beam-Assisted Etching of Si with Cl_2
Focused Ion Beam Lithography with Transition Metal Oxide Resists : Lithography Technology
Printing Sub-100 Nanometer Features Near-field Photolithography
Characteristics of SiO_2 as a High-Resolution Electron Beam Resist
A Focused He^+ Ion Beam with a High Angular Current Density
Effect of Alloy Composition in Liquid AuSi Ion Source
High Growth Rate for Slow Scanning in Electron-Beam-Induced Deposition
High Impurity Doping in Si-MBE Using Liquid Ga Ion Source
Focused Ion Beam Lithography with Transition Metal Oxide Resists

もっと見る

スポンサーリンク