Fast Proximity Corrections for Electron-Beam-Fabricated High Resolution and High-Aspect-Ratio Fresnel Zone Plate

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Fast Proximity Corrections for Electron-Beam-Fabricated High Resolution and High-Aspect-Ratio Fresnel Zone Plate
Nanofabrication of Fresnel Zone Plates for X-Ray Focusing
Microphotonic Devices Fabricated by Silicon Micromachining Techniques
Fabrication of High-Resolution Fresnel Zone Plates by a Single Layer Resist Process
Fabrication of 5 nm Resolution Electrodes for Molecular Devices by Means of Electron Beam Lithography
Electrorn-Beam Study of Nanometer Performances of the SAL 601 Chemically Amplified Resist

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