Conditions for Fabrication of Highly Conductive Wires by Electron-Beam-Induced Deposition

概要

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Conductive wires were fabricated by electron-beam-induced deposition (EBID) using WF_6 gas. It was difficult to fabricate highly conductive wires with good reproducibility unless samples were cleaned before EBID. Contamination appears to reduce the conductivity of the wires. O_2 plasma cleaning of samples before EBID seems to reduce contamination growth; however, it is not effective for regions in the vicinity of Au patterns. We found that by combining annealing at 300℃ and O_2 plasma cleaning, highly conductive wires could be fabricated with relatively good reproducibility in such regions. A linear relation was found between wire conductance and linedose at lindoses of more than 70 μC/cm. The change in deposition yield estimated from the conductance was about 12% when the gas flux was halved. Wires with a length of less than 40 nm were less conductive than longer wires because of a shortage in gas supply.
社団法人応用物理学会の論文
1999-12-30