Taguchi T | Department Of Electrical And Electronic Engineering Yamaguchi University
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概要
- TAGUCHI Tsunemasaの詳細を見る
- 同名の論文著者
- Department Of Electrical And Electronic Engineering Yamaguchi Universityの論文著者
関連著者
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TAGUCHI Takao
SORTEC Corporation
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TAGUCHI Takao
ASET Super-fine SR Lithography Laboratory
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Taguchi T
Research Laboratories Nippondenso Co. Ltd.
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TAGUCHI Tsunemasa
Department of Electrical and Electronic Engineering, Yamaguchi University
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Taguchi Tsunemasa
Graduate School Of Science And Engineering Yamaguchi University
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TAGUCHI Tsunemasa
Graduate School of Science and Engineering, Yamaguchi University
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Kurai Satoshi
Science And Engineering Yamaguchi University
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Kurai Satoshi
Department Of Electrical And Electronic Engineering Tokushima University
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Taguchi Tsunemasa
Faculty Of Engineering Yamaguchi University
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KURAI Satoshi
Graduate School of Science and Engineering, Yamaguchi University
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Taguchi T
Department Of Materials Science And Engineering Yamaguchi University
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Kurai Satoshi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Yamaguchi University
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Uchida Yuji
Faculty Of Engineering Yamaguchi University
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Hokama A
Control And Prevention Of Infectious Diseases Department Of Medicine And Therapeutics Faculty Of Med
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Hokama Akira
琉球大学 医学部感染病態制御学
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UCHIDA Yuji
Faculty of Engineering, Yamaguchi University
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Kobayashi Sota
Silicon Systems Research Laboratories Nec Corporation
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Kurai Satoshi
Graduate School Of Science And Engineering Yamaguchi University
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Aoyama H
Aset Super-fine Sr Lithography Laboratory
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Aoyama Hajime
Super-fine Sr Lithography Laboratory Association Of Super-advanced Electronics Technologies(aset) At
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Aoyama Hajime
Super-fine Sr Lithography Lab. Association Of Super-advanced Electronics Technologies (aset) Co Ntt
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Kobayashi S
Science University Of Tokyo In Yamaguchi
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Kobayashi S
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology(aist)
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Yamada Y
Akita Univ. Akita Jpn
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Yamada Yuh
National Research Institute For Metals
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Sasaki Fumio
Electrotechnical Laboratory
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Kobayashi Shunsuke
Electrotechnical Laboratory
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TANI Toshiro
Electrotechnical Laboratory, Tsukuba
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Hokama Akira
The First Department Of Internal Medicine Faculty Of Medicine University Of The Ryukyus
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Tani Toshiro
Electrochnical Laboratory
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YAMADA Yoichi
Department of Electrical and Electronic Engineering, Yamaguchi University
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FUKUI Takeshi
Graduate School of Science and Engineering, Yamaguchi University
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MIYACHI Tsutomu
Graduate School of Science and Engineering, Yamaguchi University
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Fukui Takeshi
Graduate School Of Science And Engineering Yamaguchi University
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Miyachi Tsutomu
Graduate School Of Science And Engineering Yamaguchi University
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Sakuta Hiroaki
Graduate School Of Science And Engineering Yamaguchi University
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SAKUTA Hiroaki
Graduate School of Science and Engineering, Yamaguchi University
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NAKAMURA Nobutaka
Choshu Industry CO., LTD
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Kamon Kunihito
Graduate School Of Science And Engineering Yamaguchi University
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Yamashita Yohachi
Toshiba Materials & Devices Research Laboratories
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Matsui Yasushi
Electronics Research Laboratory Corporate Research & Development Matsushita Electronics Corporat
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小野寺 力
Electronic Engineering Course Aomori Prefectural Towada Technical Senior High School
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Matsui Y
Assoc. Super‐advanced Electronics Technol. (aset) Kanagawa Jpn
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Matsui Y
Nims Tsukuba Jpn
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IBA Yoshihisa
Fujitsu Laboratories Ltd.
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KUMASAKA Fumiaki
Fujitsu Laboratories Ltd.
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Nakamura Nobutaka
Choshu Industry Co. Ltd
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SHOJI Tadayoshi
Department of Electronics, Tohoku Institute of Technology
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MORITA Hirofumi
NTT LSI Laboratories
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NAKAMURA Seiji
Department of Surgery, Shimane Medical University
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KAMON Kunihito
Faculty of Engineering, Yamaguchi University
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HAYASHI Hideki
Faculty of Engineering, Yamaguchi University
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YAMASHITA Yoshio
SORTEC Corporation
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Morita H
Lcd Division Toshiba Corporation
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Yoshida Y
Department Of Energy Engineering And Science Nagoya University
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Yamashita Y
Power Supply Materials And Devices Laboratory Corporate R&d Center Toshiba Corporation
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Yamashita Yohachi
Corporate R&d Center Toshiba Corporation
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Shoji T
Department Of Electronics Tohoku Institute Of Technology
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FUKUDA Makoto
NTT Telecommunications Energy Laboratories
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MORITA Hirofumi
NTT Telecommunications Energy Laboratories
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Yamaguchi Yoh-ichi
Hoya Corporation
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吉田 陽一
阪大産研
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Nakamura Shuji
Department Of Research And Development Nichia Chemical Industries Ltd.
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Kozo Hoshino
Graduate School Of Integrated Arts And Sciences Hiroshima University
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ONODERA Chikara
Electronic Engineering Course, Aomori Prefectural Towada Technical Senior High School
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HAGA Tetsuya
Department of Applied Physics, Hokkaido University
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Yokoyama Y
Inst. For Materials Res. Tohoku Univ.
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AOYAMA Hajime
ASET Super-fine SR Lithography Laboratory, co NTT Telecommnications Energy Laboratories
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MATSUI Yasuji
ASET Super-fine SR Lithography Laboratory, co NTT Telecommnications Energy Laboratories
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Haga T
Ntt Telecommunications Energy Lab. Kanagawa Jpn
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Oizumi H
Hitachi Ltd. Tokyo Jpn
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Oizumi H
Aset Euvl Lab. Kanagawa Jpn
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Oizumi Hiroaki
Sortec Corporation
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Hattori Tadashi
Research Laboratories, Nippondenso Co., Ltd.
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Suzuki M
Shizuoka Univ. Hamamatsu
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Yamada Y
Department Of Quantum Science And Energy Engineering Tohoku University
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Okada K
Yamaguchi Univ. Yamaguchi Jpn
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Suzuki M
Department Of Electronic Engineering Faculty Of Engineering Hokkaido University
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Aoyama Hajime
Fujitsu Laboratories Ltd.
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Watanabe Teruo
Futaba Corporation
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Atoda Nobufumi
Laboratory For Advanced Optical Technology National Institute Of Advanced Industrial Science And Tec
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Atoda N
Sortec Ibaraki Jpn
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Atoda Nobufumi
Sortec
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Murakami K
静岡大学電子工学研究所
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Iizuka Takashi
Fujitsu Laboratories Ltd.:aset Super-fine Sr Lithography Laboratory
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Watanabe T
Components Development Group Sony Corporation
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Watanabe T
Ritsumeikan Univ. Shiga Jpn
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Watanabe Tetsu
Components Development Group Sony Corporation
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Shoji Tadayoshi
Department Of Electronics Tohoku Institute Of Technology
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Watanabe T
Tokyo Inst. Technol. Kanagawa Jpn
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Watanabe T
Reserch And Development Division Toto Ltd.
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Hoshino K
Japan Atomic Energy Res. Inst. Ibaraki Jpn
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Hattori Tetsuya
Depaetment Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Suzuki Mitsuru
Cryogenic Centre University Of Tokyo
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Nagata H
Sumitomo Osaka Cement Co. Ltd. Chiba Jpn
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KURAI Satoshi
Department of Electrical and Electronic Engineering, University of Tokushima
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Yoshida Yoichi
The Institute Of Scientific And Industrial Research Osaka University
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TAGUCHI Toyoki
Research and Development Center, Toshiba Corporation
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SATOH Hiroharu
Research and Development Center, Toshiba Corporation
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SUGAYA Toshihiro
Research and Development Center, Toshiba Corporation
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KOBAYASHI Tadashi
Information Systems Engineering Laboratory, Toshiba Corporation
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HARAICHI Satoshi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology
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KUBO Shuichi
Department of lmmunology The tokyo Metropolitan Institute of Medical Science
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Kubo S
Department Of Electrical And Electronic Engineering Faculty Of Engineering Yamaguchi University
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Kubo Shuichi
Department Of Internal Medicine Saiseikai Yokohama-shi Nanbu Hospital
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HARAICHI Satoshi
Electrotechnical Laboratory
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Yamada Yasusada
Advanced Research Institute Waseda University:advanced Science Research Center Japan Atomic Energy R
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Kawashima H
Electrotechnical Laboratory Tsukuba
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MAEJIMA Yukihiko
SORTEC Corporation
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WATANABE Takeo
SORTEC Corporation
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Watanabe T
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Watanabe T
Tohoku Univ. Sendai Jpn
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Watanabe Toshihide
Atr Adaptive Communications Research Laboratories:(present Address)science And Technical Research La
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KAWASHIMA Hitoshi
Electrotechnical Laboratory, Tsukuba
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KOMURO Masanori
Electrotechnical Laboratory
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HORIUCHI Kei
Fujitsu Laboratories Ltd.
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OKADA Kiyohiko
Department of Electrical and Electronic Engineering, Yamaguchi University
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DEGUCHI Kimiyoshi
NTT Telecommunications Energy Laboratories
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Suzuki M
Sci. Univ. Tokyo Chiba Jpn
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Suzuki M
Research Center Asahi Glass Co. Ltd.
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Kawashima H
Japan Atomic Energy Res. Inst. Ibaraki Jpn
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UENO Yoshiki
Advanced Mobile Telecommunication Technology Inc.
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Hattori Takashi
Central Research Laboratory Hitachi Ltd.
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Okada Kiyohiko
Department Of Electrical And Electronic Engineering Yamaguchi University
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Suzuki Masanori
Ntt Telecommunications Energy Laboratories
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Yamashita Yoshio
Sortec Corporation:(present Address) Oki Electric Industry Co. Ltd.
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Murakami Kouichi
Institute Of Material Science University Of Tsukuba
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Takeshita Junichi
Faculty Of Engineering Yamaguchi University
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TAGAWA Seiichi
The Institute of Scientific and Industrial Research, Osaka University
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小野寺 力
青森県立十和田工業高等学校
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Fujimoto Masahiro
Faculty Of Engineering Hiroshima University
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YOSHIDA Masaaki
Department of Electrical and Computer Engineering, Hachinohe National College of Technology
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MISHIRO Kazuya
Graduate School of Science and Engineering, Yamaguchi University
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Shigematsu Hiroshi
Department Of Medicine Keio University School Of Medicine
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Mishiro Kazuya
Graduate School Of Science And Engineering Yamaguchi University
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Yokoyama Yoshihiko
Institute For Materials Research Tohoku University
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HIRAKI Akio
Department of Electrical Engineering, Faculty of Engineering, Osaka University
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Yoshida Masaaki
Department Of Electrical And Computer Engineering Hachinohe National College Of Technology
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中山 喜萬
阪大工
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NAKAMURA Naoto
Department of Information Processing, Tokyo Institute of Technology
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ODA Masatoshi
NTT LSI Laboratories
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MOROSAWA Tetsuo
NTT LSI Laboratories
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research, Osaka University
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YOSHIDA Yoichi
The Institute of Scientific and Industrial Research, Osaka University
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NAGAHARA Seiji
The Institute of Scientific and Industrial Research, Osaka University
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NAKAYAMA Yoshinori
ASET Super-fine SR Lithography Laboratory, co NTT Telecommnications Energy Laboratories
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MATSUDA Tadahito
NTT Telecommunications Energy Laboratories
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AOYAMA Hajime
Super-fine SR Lithography Laboratory, Association of Super-Advanced Electronics Technologies(ASET),
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ODA Masatoshi
NTT Telecommunications Energy Laboratories
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ODA Masatoshi
NTT System Electronics Laboratories
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MATSUDA Tadahito
NTT System Electronics Laboratories
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research
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Nakamura Nobuo
Central Research Laboratory Hitachi Ltd.
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Nakamura N
Tokyo Inst. Technol. Yokohama Jpn
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Yamamoto Y
College Of Engineering Hosei University
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Yamamoto Yuichi
Division Of Electronic And Information Engineering Faculty Of Technology Tokyo University Of Agricul
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ANDO Tsuyoshi
Department of Agricultural Chemistry, The University of Tokyo
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Yamamoto Y
Nippon Steel Corp. Kawasaki Jpn
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Kobayashi S
Faculty Of Engineering Niigata University
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Ikeda Ken-ichi
Research And Development Center Toshiba Corporation
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SHIMURA Kei
Optical Data Storage Center, Optical Sciences Center, Univeristy of Arizona
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FUJIMOTO Sadanari
Research and Development Center, Toshiba Corporation
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HASEGAWA Hiroshi
Research and Development Center, Toshiba Corporation
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KOBORI Hiromichi
Research and Development Center, Toshiba Corporation
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SUZUKI Katsumi
Information Systems Engineering Laboratory, Toshiba Corporation
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KAI Ayako
Department of Electrical and Electronic Engineering, Yamaguchi University
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Hiraki Akio
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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MURAKAMI Katsuhiko
Main Research Laboratory, Nikon Corporation
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NAGATA Hiroshi
Main Research Laboratory, Nikon Corporation
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OHTANI Masayuki
Main Research Laboratory, Nikon, Corporation
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OSHINO Tetsuya
Main Research Laboratory, Nikon, Corporation
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MURAKAMI Katsuhiko
Nikon Corporation
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OHTANI Masayuki
Nikon Corporation
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NAGATA Hiroshi
Nikon Corporation
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Nakamura Noboru
Functional Materials Research Center Sanyo Electric Co. Ltd.
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HATTORI Takeo
New Industry Creation Hatchery Center, Tohoku University
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TAGUCHI Takao
Super-fine SR Lithography Laboratory, Association of Super-Advanced Electronics Technologies (ASET),
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SUGIYAMA Yoshinobu
Electrotechnical Laboratory
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YAMADA Yoihi
Department of Electrical and Electronic Engineering, Yamaguchi University
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SHINOMIYA Gen-ichi
Department of Research and Development, Nichia Chemical Industries, Ltd.
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TANIGUCHI Hitofumi
Fujisawa Lab., Tokuyama Corp.
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SAMBONSUGI Yasuhiro
Fujitsu Laboratories Ltd.
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Taguchi Takao
Super-fine Sr Lithography Laboratory Association Of Super-advanced Electronics Technologies (aset) C
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Tacano Munecazu
Electrotechnical Laboratory
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Tacano Munecazu
Electrotechnical Laboratory:(presernt Address) Kyocera Corp.
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TAKESHITA Junichi
Graduate School of Science and Engineering, Yamaguchi University
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FUKUI Tsuyoshi
Graduate School of Science and Engineering, Yamaguchi University
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FUJII Satoshi
Science and Engineering, Yamaguchi University
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MIYACHI Tsutomu
Science and Engineering, Yamaguchi University
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FUKUI Tsuyoshi
Science and Engineering, Yamaguchi University
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SAKUTA Hiroaki
Science and Engineering, Yamaguchi University
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NAKAMURA Noritaka
Science and Engineering, Yamaguchi University
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UCHIDA Yuji
Science and Engineering, Yamaguchi University
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TAGUCHI Tsunemasa
Science and Engineering, Yamaguchi University
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Kozawa Takahiro
The Institute Of Scientific And Industrial Research Osaka University
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Sasaki Kunihiko
Research Laboratories Nippondenso Co. Ltd.
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Nagata Hiroshi
Main Research Laboratory Nikon Corporation
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Shigematsu Hisao
Fujitsu Laboratories Ltd.
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Nakamura Nobuhiro
Department Of Electronics And Information Science Faculty Of Engineering And Design Kyoto Institute
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Fujimoto Masayuki
Taiyo Yuden Co. Lid.
著作論文
- Threshold Current Density in ZnS/MgBeZnS Quantum Well Ultraviolet Lasers
- Development of White Light Emitting Diodes by Multi-layered Red, Green, and Bule Phosphors Excited by Near-ultraviolet Light Emitting Diodes
- Near-ultraviolet LED of the External Quantum Efficiency Over 45% and its Application to High-color Rendering Phosphor Conversion White LEDs
- Proton Transfer to Melamine Crosslinkers in X-Ray Chemically Amplified Negative Resists Studied by Time-Resolved and Steady-State Optical Absorption Measurement
- High-Density Recording Characteristics of a 90 mm Phase-Change Optical Disk
- Transient Species Induced in X-ray Chemically Amplified Positive Resists:Post-Exposure Delay Effect
- Fabrication of 0.1μm Line-and-Space Patterns using Soft X-Ray Reduction Lithography
- Sub-0.1 μm Resist Patterning in Soft X-Ray (13 nm) Projection Lithography
- Alternative Interpretation of Impulse Response of Phonon-Polaritons
- Excitation of Phonon-Polaritons with Asymmetric Transient Grating
- Dependence of Light Extraction From Near-Ultraviolet Light-Emitting Diodes on Refraction Index, Transmittance and Shape
- Biexciton Luminescence from GaN Epitaxial Layers
- Time-Resolved Observation of Laser-Induced Surface Reaction for Si/Cl_2 System Using Second-Harmonic Generation
- Excitonic Emission in GaN Films on AlN Substrates Using Microwave-Excited N Plasma Method
- Observation of Etching Reaction for Si/XeF_2 System Using Second-Harmonic Generatiorn
- Sub-100-nm Device Fabrication using Proximity X-Ray Lithography at Five Levels
- Study on the Luminous and Thermal Characteristics of High-Power Near-Ultraviolet LED Packages with Various Chip Arrangements
- Development of Light Sources by Large-Scale Integrated Light-Emitting Diodes
- Analysis of Chip/Bump/Ceramic Interface of Flip-Chip Bonded LED Directly on Ceramic Packages
- Structural Characterization of High-Quality ZnS Epitaxial Layers Grown on GaAs Substrates by Low-Pressure Metalorganic Chemical Vapor Deposition : Surfaces, Interfaces, and Films
- Temperature Dependence of Free-Exciton Ltuninescence from High-Quality ZnS Epitaxial Layers
- Optical characterization of high-quality ZnS epitaxial films grown by low-pressure metalorganic chemical vapor deposition
- Reduction of Inhomogeneous Broadening of Exciton Luminescence in Cd_xZn_Se Ternary Alloys and Cd_xZn_Se-ZnSe Multiple Quantum Wells Grown by Molecular-Beam Epitaxy under Se-Excess Supply
- High-Performance X-Ray Mask Fabrication Using TaGeN Absorber and Dummy Pattern Method for Sub-100nm Proximity X-Ray Lithography : Instrumentation, Measurement, and Fabrication Technology
- Evaluation of Overlay Accuracy for 100-nm Ground Rule in Proximity X-Ray Lithography
- Performance of X-Ray Stepper for Next-Generation Lithography
- Pattern Etching of Ta X-ray Mask Absorber on SiC Membrane by Inductively Coupled Plasma
- Precise Stress Control of Ta Absorber using Low Stress Alumima Etching Mask for X-Ray Mask Fabrication
- Homoepitaxial Growth of GaN Layers by Reactive Molecular-Beam Epitaxy on Bulk GaN Single Crystals Prepared by Pressure-Controlled Solution Growth
- Effect of Cooling Process after GaN Epitaxial Growth by Radio-Frequency Molecular Beam Epitaxy : Semiconductors
- Effects of Hg Annealing on Photoluminescence Spectra of CdTe Crystals and MOCVD-Grown CdTe/GaAs Films
- Performance of a 600 Mbyte 90 mm Phase-Change Optical Disk against Disk Tilt
- 60GHz mixer MMIC for millimeter wave radar
- Critical Layer Thickness of n-In_Al_AS/In_Ga_As/In_Al_AS Pseudomorphic Heterostructures Studied by Photoluminescence
- Fabrication and Illuminance Properties of Phosphor-conversion Green Light-emitting Diode with a Luminous Efficacy over 100 lm/W
- Exciton Binding Energy under Electric Field in ZnTe1-xSx/ZnS Strained-Layer Superlattices
- Valence Band Structure and Optical Gain in Cd_xZn_/ZnS Quantum Wells : Short Note