Pattern Etching of Ta X-ray Mask Absorber on SiC Membrane by Inductively Coupled Plasma
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-07-01
著者
-
Hokama A
Control And Prevention Of Infectious Diseases Department Of Medicine And Therapeutics Faculty Of Med
-
Hokama Akira
琉球大学 医学部感染病態制御学
-
TAGUCHI Takao
SORTEC Corporation
-
Aoyama H
Aset Super-fine Sr Lithography Laboratory
-
Aoyama Hajime
Super-fine Sr Lithography Laboratory Association Of Super-advanced Electronics Technologies(aset) At
-
Aoyama Hajime
Super-fine Sr Lithography Lab. Association Of Super-advanced Electronics Technologies (aset) Co Ntt
-
Aoyama Hajime
Fujitsu Laboratories Ltd.
-
Taguchi T
Research Laboratories Nippondenso Co. Ltd.
-
Hokama Akira
The First Department Of Internal Medicine Faculty Of Medicine University Of The Ryukyus
-
IBA Yoshihisa
Fujitsu Laboratories Ltd.
-
TAGUCHI Takao
ASET Super-fine SR Lithography Laboratory
-
KUMASAKA Fumiaki
Fujitsu Laboratories Ltd.
-
TAGUCHI Takao
Fujitsu Laboratories Ltd.
-
YAMABE Masaki
Fujitsu Laboratories Ltd.
-
Iba Yoshihisa
Fujitsu Laboratories Ltd.:aset Super-fine Sr Lithography Laboratory
-
Yamabe M
Semiconductor Leading Edge Technologies Inc.
-
Taguchi T
Department Of Electrical And Electronic Engineering Yamaguchi University
-
AOYAMA Hidetake
Department of Electrical Engineering, Faculty of Engineering, Gunma University
-
Kumasaka Fumiaki
Fujitsu Laboratories Ltd.:aset Super-fine Sr Lithography Laboratory
関連論文
- Ta/SiC X-Ray Mask
- Threshold Current Density in ZnS/MgBeZnS Quantum Well Ultraviolet Lasers
- Development of White Light Emitting Diodes by Multi-layered Red, Green, and Bule Phosphors Excited by Near-ultraviolet Light Emitting Diodes
- Near-ultraviolet LED of the External Quantum Efficiency Over 45% and its Application to High-color Rendering Phosphor Conversion White LEDs
- Proton Transfer to Melamine Crosslinkers in X-Ray Chemically Amplified Negative Resists Studied by Time-Resolved and Steady-State Optical Absorption Measurement
- Critical-Dimension Controllability of Chemically Amplified Resists for X-Ray Membrane Mask Fabrication
- Precise Delineation Characteristics of Advanced Electron Beam Mask Writer EB-X3 for Fabricating 1x X-Ray Masks
- EUVリソグラフィーを用いた70nmピッチCu/ポーラス低誘電率膜デュアルダマシンインテグレーションの基礎検討(配線・実装技術と関連材料技術)
- 高精度電子ビーム描画装置によるX線マスク描画特性
- EFFICACY OF HIGH-LEVEL DISINFECTANTS FOR GASTROINTESTINAL ENDOSCOPE DISINFECTION AGAINST STRONGYLOIDES STERCORALIS
- High-Density Recording Characteristics of a 90 mm Phase-Change Optical Disk
- Transient Species Induced in X-ray Chemically Amplified Positive Resists:Post-Exposure Delay Effect
- An Improved Electron Scattering Simulation at the Mask in a Projection Lithography System
- Nanometer-Scale Layer Removal of Aluminum and Polystyrene Surfaces by Ultrasonic Scratching ( Scanning Tunneling Microscopy)
- Alcoholic liver cirrhosis complicated with torsade de pointes during plasma exchange and hemodiafiltration
- Fabrication of 0.1μm Line-and-Space Patterns using Soft X-Ray Reduction Lithography
- Sub-0.1 μm Resist Patterning in Soft X-Ray (13 nm) Projection Lithography
- Alternative Interpretation of Impulse Response of Phonon-Polaritons
- Excitation of Phonon-Polaritons with Asymmetric Transient Grating
- Dependence of Light Extraction From Near-Ultraviolet Light-Emitting Diodes on Refraction Index, Transmittance and Shape
- Whipple's Disease : the First Japanese Case Diagnosed by Electron Microscopy and Polymerase Chain Reaction
- Successful Long-term Treatment with Cyclosporin A in Protein Losing Gastroenteropathy
- Pulseless Hematochezia: Takayasu's Arteritis Associated with Ulcerative Colitis
- A Patient with Primary Biliary Cirrhosis Complicated with Slowly Progressive Insulin-dependent Diabetes Mellitus
- ENDOSCOPIC BAND LIGATION FOR POSTPOLYPECTOMY GASTRIC BLEEDING
- A patient with primary biliary cirrhosis associated with autoimmune hemolytic anemia
- Biexciton Luminescence from GaN Epitaxial Layers
- Time-Resolved Observation of Laser-Induced Surface Reaction for Si/Cl_2 System Using Second-Harmonic Generation
- Excitonic Emission in GaN Films on AlN Substrates Using Microwave-Excited N Plasma Method
- Observation of Etching Reaction for Si/XeF_2 System Using Second-Harmonic Generatiorn
- Sub-100-nm Device Fabrication using Proximity X-Ray Lithography at Five Levels
- Study on the Luminous and Thermal Characteristics of High-Power Near-Ultraviolet LED Packages with Various Chip Arrangements
- Development of Light Sources by Large-Scale Integrated Light-Emitting Diodes
- Analysis of Chip/Bump/Ceramic Interface of Flip-Chip Bonded LED Directly on Ceramic Packages
- Structural Characterization of High-Quality ZnS Epitaxial Layers Grown on GaAs Substrates by Low-Pressure Metalorganic Chemical Vapor Deposition : Surfaces, Interfaces, and Films
- Temperature Dependence of Free-Exciton Ltuninescence from High-Quality ZnS Epitaxial Layers
- Optical characterization of high-quality ZnS epitaxial films grown by low-pressure metalorganic chemical vapor deposition
- Reduction of Inhomogeneous Broadening of Exciton Luminescence in Cd_xZn_Se Ternary Alloys and Cd_xZn_Se-ZnSe Multiple Quantum Wells Grown by Molecular-Beam Epitaxy under Se-Excess Supply
- High-Performance X-Ray Mask Fabrication Using TaGeN Absorber and Dummy Pattern Method for Sub-100nm Proximity X-Ray Lithography : Instrumentation, Measurement, and Fabrication Technology
- Evaluation of Overlay Accuracy for 100-nm Ground Rule in Proximity X-Ray Lithography
- Performance of X-Ray Stepper for Next-Generation Lithography
- Pattern Etching of Ta X-ray Mask Absorber on SiC Membrane by Inductively Coupled Plasma
- Etching Residues of Sputtered Ta Film Using Chlorine-Based Plasma
- Precise Stress Control of Ta Absorber using Low Stress Alumima Etching Mask for X-Ray Mask Fabrication
- High-Efficiency Bridge Double Phase-Conjugate Mirrors in Cu-Doped (K_Na_)_(Sr_Ba_)_Nb_2O_6 Crystals
- Fraunhofer Diffraction Pattern by a Slit Aperture between a Knife Edge and a Metal Cylinder
- Phase-Conjugate Imaging Properties in High-Efficiency KNSBN:Cu Double Phase-Conjugate Mirror
- Scanning Shearing-Stress Microscopy of Gold Thin Films
- Scanning Tunneling Mieroscopy and Barrier-Height Observation of Stearic Acid Thin Films Prepared by Blot-Wall Technique
- Isolated Nanometer-Size Si Dot Arrays Fabricated Using Electron-Beam Lithography, Reactive Ion Etching, and Wet Etching in NH_4OH/H_2O_2/H_2O
- Homoepitaxial Growth of GaN Layers by Reactive Molecular-Beam Epitaxy on Bulk GaN Single Crystals Prepared by Pressure-Controlled Solution Growth
- Effect of Cooling Process after GaN Epitaxial Growth by Radio-Frequency Molecular Beam Epitaxy : Semiconductors
- Effects of Hg Annealing on Photoluminescence Spectra of CdTe Crystals and MOCVD-Grown CdTe/GaAs Films
- Performance of a 600 Mbyte 90 mm Phase-Change Optical Disk against Disk Tilt
- 60GHz mixer MMIC for millimeter wave radar
- Critical Layer Thickness of n-In_Al_AS/In_Ga_As/In_Al_AS Pseudomorphic Heterostructures Studied by Photoluminescence
- Characteristic Variation of Exposure Pattern in Cell-Projection Electron-Beam Lithography
- Pulseless Hematochezia: Takayasu's Arteritis Associated with Ulcerative Colitis
- Fabrication and Illuminance Properties of Phosphor-conversion Green Light-emitting Diode with a Luminous Efficacy over 100 lm/W
- Exciton Binding Energy under Electric Field in ZnTe1-xSx/ZnS Strained-Layer Superlattices
- Valence Band Structure and Optical Gain in Cd_xZn_/ZnS Quantum Wells : Short Note
- Reduction of Plasma Damage in Reactive Ion Etching by Means of Suppressing Self-Bias ( Plasma Processing)
- Amorphous Refractory Compound Film Material for X-Ray Mask Absorbers
- Pattern Fabrication Technique for Ta-Ge Amorphous X-Ray Absorber on a SiC Membrane by Inductively Coupled Plasma
- Effects of Etch Rate on Plasma-Induced Damage to Porous Low-$k$ Films
- Sub-100-nm Device Fabrication using Proximity X-Ray Lithography at Five Levels