OGURA Mutsuo | Electrotechnical Laboratory
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概要
関連著者
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OGURA Mutsuo
Electrotechnical Laboratory
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WANG Xue-Lun
Electrotechnical Laboratory
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Ogura M
Jst‐crest Ibaraki Jpn
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Ogura Masahiko
Energy Technology Research Institute National Institute Of Advanced Industrial Science And Technolog
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Wang X‐l
National Institute Of Advanced Industrial Science And Technology (aist)
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Wang Xue-lun
Division Of Electron Devices Electrotechnical Laboratory
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MATSUHATA Hirofumi
Electrotechnical Laboratory
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YAO Takafumi
Electrotechnical Laboratory
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Ogura Mutsuo
National Institute Of Advanced Industrial Science And Technology (aist)
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Yao Takafumi
Electrical Laboratory
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Matsuhata H
Aist Tsukuba Jpn
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Matsuhata Hirofumi
Division Of Electron Devices Electrotechnical Laboratory
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Matsuhata H
Toyota Technological Institute:(present Address)electrotechnical Laboratory
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KIM Tae
Electrotechnical Laboratory(ETL)
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Kim Tae
National Institute Of Advanced Industrial Science And Technology (aist):crest-japan Science And Tech
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Ogura Mutsuo
National Institute Of Advanced Industrial Science And Technology (aist):crest-japan Science And Tech
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Son Chang-sik
National Institute Of Advanced Industrial Science And Technology (aist):crest-japan Science And Tech
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Son Chang-sik
Department Of Materials Science Korea University・semiconductor Materials Research Center Korea Insti
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TADA Tetsuya
Electrotechnical Laboratory
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HAMOUDI Ali
Electrotechnical Laboratory
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IKAWA Seiji
Electrotechnical Laboratory
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MIYAGAWA Takehiko
Electrotechnical Laboratory
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TAKEYAMA Kazuhisa
Electrotechnical Laboratory
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SHIMIZU Keizo
Electrotechnical Laboratory
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HATA Toshio
Electrotechnical Laboratory
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KOMURO Masanori
Electrotechnical Laboratory
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Shimizu K
Electrotechnical Laboratory
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Shimizu Keizo
Electrotechnical Labolatory
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Son Chang-Sik
Electron Device Division, Electrotechnical Laboratory
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Hata Toshio
Electrotechnical Laboratory:tokai University
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Hata T
Kanazawa Univ. Kanazawa Jpn
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Komuro M
Mirai Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Scienc
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Wada T
Department Of Materials Chemistry Ryukoku University
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HAYASHI Yutaka
Electrotechnical Laboratory
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Tackeuchi Atsushi
Department Of Applied Physics Waseda University
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Wada Osamu
FESTA Laboratories
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KOMORI Kazuhiro
Electrotechnical Laboratory (ETL), AIST, MITI
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IMANISHI Hideki
Nippon Sheet Glass Co., Ltd
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SUGAYA Takeyoshi
Electrotechnical Laboratory (ETL)
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KUROSU Tateki
Department of Electronics, School of Information Technology and Electronics, Tokai University
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Wada Takao
Department Of Electrical And Computer Engineering Nagoya Institute Of Technology
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Mori K
Sci. Univ. Tokyo In Yamaguchi Yamaguchi Jpn
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Kim Seong-jin
Electrotechnical Laboratory And Crest Japan Science And Technology Corporation(jst):new Energy And I
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OGURA Mutsuo
Optoelectronic Division, Electrotechnical Laboratory
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KAJI Ryosaku
Optoelectronic Division, Electrotechnical Laboratory
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MORI Masahiko
Electrotechnical Laboratory, Optical Information Section
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Matsumoto Kazuhiko
Electrotechnical Laboratory (etl)
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Imanishi Hideki
Nippon Sheet Glass Co. Ltd
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Igarashi Takashi
Laboratory Of Biochemical Pharmacology And Biotoxicology Faculty Of Pharmaceutical Sciences Chiba Un
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Igarashi Takashi
Electrotechnical Laboratory
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Komori K
Faculty Of Engineering Tokyo Institute Of Technology
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Wada T
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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TOKUMARU Yozo
Electrotechnical Laboratory
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KAWAI Naoyuki
Electrotechnical Laboratory
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Kaji R
Optoelectronic Division Electrotechnical Laboratory
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Kikuchi T
Course Of Electronics Graduate School Of Engineering Tokai University
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SUGIYAMA Yoshinobu
Electrotechnical Laboratory
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NISHIMURA Tetsuya
FESTA Laboratories, The Femtosecond Technology Research Association
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Matsumoto Kazuhiko
Electrotechnical Laboratory (elt)
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Mori Masahiko
Electrotechnical Laboratory
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Wada T
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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WADA Toshimi
Electrotechnical Laboratory
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Okada Takumi
Electrotechnical Laboratory
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Ogura Mutsuo
Optoelectronic Division Electrotechnical Laboratory
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Ogura Mutsuo
Electrotechnical Laboratory And Crest Japan Science And Technology Corporation(jst)
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Asaka T
Seiko Epson Corporation
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Kurosu T
Department Of Electronics School Of Engineering Tokai University
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Kurosu Tateki
Department Of Electronics Faculty Of Engineering Tokai University
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Hashizume N
Electrotechnical Laboratory
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Hashizume Nobuo
Electrotechnical Laboratory
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SHIDA Katsunori
Electrotechnical Laboratory
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Nishimura Tetsuya
Festa Laboratories The Femtosecond Technology Research Association:(present) Advanced Technology R&a
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Iwano H
Seiko Epson Corporation
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Shida K
Saga Univ. Saga Jpn
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FUJII Seiji
Electrotechnical Laboratory
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MORI Masato
Electrotechnical Laboratory
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MORI Katsumi
Seiko Epson Corporation
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ASAKA Tatsuya
Seiko Epson Corporation
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IWANO Hideaki
Seiko Epson Corporation
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Kikuchi Takuya
Graduate School of Engineering, Tokai University
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Kaji Ryosaku
Electrotechnical laboratory
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Miyagawa Takehiko
R and D center, Shindengen Kougyou Co., Ltd
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YOSHIZAWA Akio
Electrotechnical Laboratory
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Sakaue Katsuhiko
Electrotechnical laboratory
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MATSUOKA Seiichi
Electrotechnical Laboratory
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MORISHITA Toshihide
Electrotechnical Laboratory
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Sugiyama Yoshinobu
Electrotechnical Laboratory And Crest Japan Science And Technology Corporation(jst)
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Sugaya Takeyoshi
Electrotechnical Laboratory
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Sugaya Takeyoshi
Electrotechnical Laboratory And Crest Japan Science And Technology Corporation(jst)
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Igarashi T
Nippon Beohringer Ingelheim Co. Ltd. Hyogo Jpn
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Miyagawa T
R And D Center Shindengen Kougyou Co. Ltd
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Matsumoto Kazuhiko
Electrotechnical Laboratory
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Wada Osamu
Festa Laboratories The Femtosecond Technology Research Association
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Igarashi Takashi
Analytical And Metabolic Research Laboratories And Biological Research Laboratories Sankyo Co. Ltd.:faculty Of Pharmaceutical Sciences Chiba University
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Tada Tetsuya
Electrotechnical Laboratory, 1-1-4 Umesono, Tsukuba, 305 Japan
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Miyagawa Takehiko
Electrotechnical Laboratory, 1-1-4 Umesono, Tsukuba, 305 Japan
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Kim Seon-Jin
Electrotechnical Laboratory and CREST, Japan Science and Technology Corporation(JST):New Energy and Industrial Technology Development Organization(NEDO):(Present address)Electronics and Telecommunications Research Institute
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Wang Xue-Lun
Electrotechnical Laboratory, 1-1-4 Umesono, Tsukuba, 305 Japan
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Ikawa Seiji
Electrotechnical Laboratory, 1-1-4 Umesono, Tsukuba, 305 Japan
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Matsuhata Hirofumi
Electrotechnical Laboratory, 1-1-4 Umesono, Tsukuba, 305 Japan
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Takeyama Kazuhisa
Electrotechnical Laboratory, 1-1-4 Umesono, Tsukuba, 305 Japan
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KUROSU Tateki
Department of Electronics
著作論文
- Proposal of a New Self-Limited Growth and Its Application to the Fabrication of Atomically Uniform Quantum Nanostructures
- Electron States in Crescent GaAs Coupled Quantum-Wires
- Fabrication of Quantum Wire and Minute Buried Heterostructure by In Situ Etching and Selective MOCVD Growth
- Distributed Feed Back Surface Emitting Laser Diode with Multilayered Heterostructure
- GaAs/Al_xGa_As Multilayer Reflector for Surface Emitting Laser Diode
- Spectral Characteristics of Vertically Stacked Etched Multiple-Quantum-Wire Lasers Fabricated by Flow Rate Modulation Epitaxy
- V-groove AlGaAs/GaAs multilayers grown on patterned GaAs substrates with submicron gratings
- V-groove AlGaAs/GaAs multilayers grown on patterned GaAs substrates with submicron gratings
- Proposal of a New Self-Limited Growth and Its Application to the Fabrication of Atomically Uniform Quantum Nanostructures
- Electron Spin Relaxation in GaAs/AlGaAs Quantum Wires Analyzed by Transient Photoluminescence
- Two-Dimensional Electron Gas in an n^+-GaAs/Undoped AlGaAs/Undoped GaAs SIS Structure
- Transverse Mode Characteristics of a DBR-Surface Emitting Laser with Buried Heterostructure
- Fundamental Characteristic of Capillary-Type Cluster Ion Source and Its Application for Selective Deposition of Aluminum Film : Etching and Deposition Technology
- Fundamental Characteristics of Capillary-Type Cluster Ion Source and Its Application for Selective Deposition of Aluminum Film
- Y-Branch Buried Heterostructure(BH) Laser by In-Situ Etching and Regrowth Process
- Gate-Length Dependence of Negative Differential Resistance in InGaAs/InAlAs Quantum Well Field-Effect Transistor
- Method to Determine the Effective Group Refractive Index of an Optical Waveguide Using a Steplike Optical Frequency Sweep Generator
- Scanning Optical Fiber Microscope for High Resolution Laser Beam Induced Current Image Observation of Semiconductor Defects
- Electrical and Photo-Iuminescence Properties of ZnSe Thin Films Grown by Molecular Beam Epitaxy: Substrate Temperature Effect
- Fabrication of Quantum Wire and Minute Buried Heterostructure by In Situ Etching and Selective MOCVD Growth