Fabrication of Quantum Wire and Minute Buried Heterostructure by In Situ Etching and Selective MOCVD Growth
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概要
- 論文の詳細を見る
- 1996-02-01
著者
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Wang X‐l
National Institute Of Advanced Industrial Science And Technology (aist)
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Matsuhata H
Aist Tsukuba Jpn
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Matsuhata Hirofumi
Division Of Electron Devices Electrotechnical Laboratory
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Wang Xue-lun
Division Of Electron Devices Electrotechnical Laboratory
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WANG Xue-Lun
Electrotechnical Laboratory
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OGURA Mutsuo
Electrotechnical Laboratory
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MATSUHATA Hirofumi
Electrotechnical Laboratory
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TADA Tetsuya
Electrotechnical Laboratory
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HAMOUDI Ali
Electrotechnical Laboratory
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IKAWA Seiji
Electrotechnical Laboratory
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MIYAGAWA Takehiko
Electrotechnical Laboratory
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TAKEYAMA Kazuhisa
Electrotechnical Laboratory
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Matsuhata H
Toyota Technological Institute:(present Address)electrotechnical Laboratory
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Ogura M
Jst‐crest Ibaraki Jpn
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Ogura Masahiko
Energy Technology Research Institute National Institute Of Advanced Industrial Science And Technolog
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