Strong Excitonic Emission from (001)-Oriented Diamond P-N Junction
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関連論文
- Studies on the structure of crescent-shaped GaAs quantum wires by combination of electron microscopy and photoluminescence spectroscopy
- Proposal of a New Self-Limited Growth and Its Application to the Fabrication of Atomically Uniform Quantum Nanostructures
- Electron States in Crescent GaAs Coupled Quantum-Wires
- Fabrication of Quantum Wire and Minute Buried Heterostructure by In Situ Etching and Selective MOCVD Growth
- Selective Growth of Buried n^+ Diamond on (001) Phosphorus-Doped n-Type Diamond Film
- Nanometer Scale Height Standard Using Atomically Controlled Diamond Surface
- Exciton-derived Electron Emission from (001) Diamond p-n Junction Diodes with Negative Electron Affinity
- High-Efficiency Excitonic Emission with Deep-Ultraviolet Light from (001)-Oriented Diamond p-i-n Junction
- n-Type Control by Sulfur Ion Implantation in Homoepitaxial Diamond Films Grown by Chemical Vapor Deposition
- Distributed Feed Back Surface Emitting Laser Diode with Multilayered Heterostructure
- GaAs/Al_xGa_As Multilayer Reflector for Surface Emitting Laser Diode
- Investigation of Ultrafast Carrier Dynamics in Quantum Wire by Terahertz Time-Domain Spectroscopy
- Femtosecond Pump-Probe Spectroscopy of GaAs Crescent Quantum Wires
- Excitation Wavelength Dependence of Terahertz Electromagnetic Wave Generation from Quantum Wire
- Ultrafast Coherent Control of Excitons and Exciton-Polaritons in Quantum Nanostructure
- Ultrafast Coherent Control of Excitons in Quantum Nano-Structures
- Electron Emission from a Diamond (111) p-i-n^+ Junction Diode with Negative Electron Affinity during Room Temperature Operation
- Strong Excitonic Emission from (001)-Oriented Diamond P-N Junction
- Contact Hole Etch Scaling toward 0.1 μm
- Spatial and Temporal Behavior of Radicals in Inductively Coupled Plasm for SiO_2 Etching
- Fundamental Characteristic of Capillary-Type Cluster Ion Source and Its Application for Selective Deposition of Aluminum Film : Etching and Deposition Technology
- Fundamental Characteristics of Capillary-Type Cluster Ion Source and Its Application for Selective Deposition of Aluminum Film
- MOCVD Growth and Characterization of (Al_xGa_)_yIn_P/GaAs
- A New AsH_3 Cracking Method for the MOCVD Growth of InGaAs
- InP MESFET Grown by MOCVD