Structure Analysis of GaN Thin Film with Inversion Domains by High Voltage Atomic Resolution Microscopy
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概要
- 論文の詳細を見る
- Japan Institute of Metalsの論文
- 2002-07-01
著者
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MATSUHATA Hirofumi
National Institute of Advanced Industrial Science and Technology
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OKUMURA Hajime
National Institute of Advance Industrial Science and Technology (AIST), Power Electronics Research C
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SHEN Xu-Qiang
National Institute of Advanced Industrial Science and Technology
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Matsuhata H
Toyota Technological Institute:(present Address)electrotechnical Laboratory
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Matsuhata Hirofumi
National Institute Of Advanced Industrial Science And Technology (aist) Central 2
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Okumura Hajime
National Institute Of Advanced Industrial Science And Technology
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Okumura H
Neutron Scattering Laboratory Issp The University Of Tokyo
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Okumura Hajime
National Inst. Of Advanced Sci. And Technol. Ibaraki Jpn
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Shen Xu-qiang
Power Electronics Research Center National Institute Of Advanced Industrial Science And Technology
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Shen X‐q
National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn
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Shen Xu-qiang
National Institute Of Advanced Industrial Science And Technology (aist) Central 2
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IWAMOTO Chihiro
Engineering Research Institute, The University of Tokyo
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IKUHARA Yuuichi
Engineering Research Institute, School of Engineering, University of Tokyo
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Iwamoto C
Institute Of Engineering Innovation School Of Engineering University Of Tokyo
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Okumura Hajime
National Institute Of Advanced Industrial Science And Technology (aist) Central 2
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Ikuhara Yuuichi
Engineering Research Institute School Of Engineering University Of Tokyo
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IWAMOTO Chihiro
Engineering Research Institute, Faculty of Engineering, Tire University of Tokyo
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