Okumura H | Neutron Scattering Laboratory Issp The University Of Tokyo
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概要
関連著者
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Okumura H
Neutron Scattering Laboratory Issp The University Of Tokyo
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Okumura H
National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn
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Shimizu Mitsuaki
Power Electronics Research Center National Institute Of Advanced Industrial Science And Technology
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Okumura H
National Institute Of Advanced Industrial Science And Technology Power Electronics Research Center
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Shimizu Masahiro
Ulsi Development Center Mitsubishi Electric Corporation
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Shimizu M
Advanced Industrial Science And Technology (aist) Power Electronics Research Center
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Okumura H
Electrotechnical Lab. Ibaraki Jpn
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Shimizu M
Tokyo Univ. Agriculture & Technol. Koganei
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Mitsugi Satoshi
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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Shen Xu-qiang
Power Electronics Research Center National Institute Of Advanced Industrial Science And Technology
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Shen X‐q
National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn
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Shimizu M
Tokyo Inst. Technology Yokohama
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Okumura Hajime
National Institute Of Advanced Industrial Science And Technology
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IDE Toshihide
Advanced Industrial Science and Technology (AIST), Power Electronics Research Center
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Ide Toshihide
Advanced Industrial Science And Technology (aist) Power Electronics Research Center
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OKUMURA Hajime
National Institute of Advance Industrial Science and Technology (AIST), Power Electronics Research C
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OKUMURA Hajime
Electrotechnical Laboratory (ETL)
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Okumura Hajime
National Inst. Of Advanced Sci. And Technol. Ibaraki Jpn
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Okumura Hajime
Electrotechnical Laboratory
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OKUMURA Hajime
Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology
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SHIMIZU Mitsuaki
National Institute of Advance Industrial Science and Technology (AIST), Power Electronics Research C
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Kodama Katsuaki
Department Of Physics Division Of Material Science Nagoya University:crest Japan Science And Technol
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Hara S
Advanced Industrial Science And Technology (aist) Power Electronics Research Center:ultra-low-loss P
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OKUMURA Hajime
Neutron Scattering Laboratory, ISSP, The University of Tokyo
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YAGI Shuichi
National Institute of Advanced Industrial Science and Technology
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YANO Yoshiki
Tsukuba Laboratory, Taiyo Nippon Sanso Corporation
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PIAO Guanxi
National Institute of Advanced Industrial Science and Technology
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SHEN Xu-Qiang
Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology
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SONODA Saki
ULVAC JAPAN, Ltd,
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SHIMIZU Saburo
ULVAC JAPAN, Ltd
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Sonoda S
Lvac Inc.
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Sonoda Saki
Ulvac Inc.
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SATO Masatoshi
Department of Physics,Division of Material Science,Nagoya University
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原科 浩
教養部物理学教室
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Kato Masaya
Department Of Physics Division Of Material Science Nagoya University:crest Japan Science And Technol
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Ito Masafumi
Department Of Physics Division Of Material Science Nagoya University
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Masaki Kato
Department Of Chemistry Graduate School Of Science Kyoto University
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Kanada Masaki
Department Of Physics Division Of Material Science Nagoya University
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Inada Masaki
National Institute Of Advanced Industrial Science And Technology
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IDE Toshihide
Department of Electronics and Communications, School of Science and Technology, Meiji University
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ARAI Kazuo
National Institute of Advanced Industrial Science and Technology
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AKUTSU Nakao
Tsukuba Laboratory, Taiyo Nippon Sanso Corporation
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SHIMIZU Mitsuaki
Electrotechnical Laboratory (ETL)
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SHEN Xu-Qiang
Electrotechnical Laboratory (ETL)
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HARA Shiro
Electrotechnical Laboratory (ETL)
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Kato M
Toyohashi Univ. Technol. Aichi Jpn
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Kodama Masafumi
The Graduate School Of Science And Technology Kobe University
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Kato Mayumi
Institute For Solid State Physics University Of Tokyo
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Kasai Mayumi
Department Of Physics Division Of Material Science Nagoya University
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Kato M
Institute For Solid State Physics University Of Tokyo
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Akutsu Nakao
Tsukuba Laboratory Taiyo Nippon Sanso Corporation
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Nemoto Toshio
Department Of Science And Technology Graduate School Of Meiji University
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Nemoto T
Bunkyo University
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Ide Toshihide
Department Of Electrical And Computer Engineering Yokohama National University
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KAKURAI Kazuhisa
Neutron Scattering Laboratory, Institute for Solid State Physics, The University of Tokyo
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HARASHINA Hiroshi
Department of Physics,Division of Material Science,Nagoya University
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KADOWAKI Hiroaki
Department of Physics, Tokyo Metropolitan University
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ITO Masafumi
Department of Pathology, Japanese Red Cross Nagoya Daiichi Hospital
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Kobayashi Hisao
Department Of Physics Graduate School Of Science Tohoku University
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Kodama Katsuaki
Department Of Physics Division Of Material Science Nagoya University
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YASUI Yukio
Department of Physics, Division of Material Science, Nagoya University
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Ishida Y
Kitakyushu Foundation For The Advancement Of Ind. Sci. And Technol. Kitakyushu Jpn
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NEMOTO Toshio
Department of Electronics and Communications, School of Science and Technology, Meiji University
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Kakurai Kazuhisa
Neutron Scattering Laboratory Institute For Solid State Physics The University Of Tokyo
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SUZUKI Akira
Graduate School of Engineering, Tokai University
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IDE Toshihide
Electrotechnical Laboratory (ETL)
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Kadowaki H
Tokyo Metroporitan Univ. Tokyo
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Kadowaki Hiroaki
The Institute For Soild State Physics The University Of Tokyo
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Kadowaki Hiroaki
Department Of Physics Tokyo Metroporitan University
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Kamimura Hirohiko
Department Of Materials Science Hiroshima University
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Kawanaka H
National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn
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Kato M
Nagoya Univ. Nagoya Jpn
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ISHIDA Yuuki
National Institute of Advanced Industrial Science and Technology
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TAKAHASHI Tetsuo
National Institute of Advanced Industrial Science and Technology
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Kato Hideyuki
Department Of Physics Faculty Of Science Hokkaido University
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Takahashi Tetsuo
National Institute Of Advanced Industrial Science And Technology Power Electronics Research Center
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Kadowaki Hiroaki
The Institute For Solid State Physics The University Of Tokyo
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Nemoto Toshio
Department Of Business And Information Faculty Of Information And Communication Bunkyo University
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Takahashi T
Japan Advanced Institute Of Science And Technology
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KAKURAI Kazuhisa
CREST,Japan Science and Technology Corporation (JST)
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Suzuki Y
Showa Shell Sekiyu K.k. Kanagawa
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BALAKRISHNAN K.
静岡大
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Balakrishnan K.
静岡大学電子工学研究所
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Kato Masatune
Department Of Physics Faculty Of Science Hiroshima University
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Balakrishnan Krishnan
名城大学理工学部材料機能工学科
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Suzuki Y
Hitachi Ltd. Tokyo Jpn
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Suzuki Y
Optoelectronic Division Electrotechnical Laboratory
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K バラクリシュナン
静岡大学電子工学研究所
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Kimata Motoi
The Graduate School Of Science And Technology Kobe University
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Cho D‐h
National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn
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Cho Dong-hyun
National Institute Of Advance Industrial Science And Technology (aist) Power Electronics Research Ce
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SHIMIZU Mitsuaki
Advanced Industrial Science and Technology (AIST), Power Electronics Research Center
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OHASHI Hiromichi
National Institute of Advanced Industrial Science and Technology
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HIRATA Yoshitaka
Department of Science and Technology, Graduated School of Meiji University
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PIAO Guanxi
Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology
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IDE Toshihide
Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology
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SHEN Xu-Qiang
National Institute of Advanced Industrial Science and Technology
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CHO Sung-Hwan
Electrotechnical Laboratory (ETL)
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SHIRAKASHI Jun-ichi
Electrical and Electronic System Engineering, Tokyo University of Agriculture and Technology
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YOSHIKAWA Masahito
Japan Atomic Energy Research Institute, Takasaki Radiation Chemistry Research Establishment
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Balakrishnan Krishnan
Electrotechnical Laboratory
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SUZUKI Yoshifumi
NTT Electrical Communications Laboratories
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Suzuki Yoshiichi
Central Research And Development Laboratory Showa Shell Sekiyu K.k.
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Suzuki Yoshifumi
Department Of Materials Science Faculty Of Engineering Kyushu Institute Of Technology
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Suzuki Yoshishige
Joint Research Center For Atom Technology(jrcat)-national Institute For Advanced Interdisciplinary R
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Suzuki Yasuzou
Nanotechnology Research Institute National Institute Of Advanced Industrial Science And Technology
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Yoshikawa Masahito
Japan Atomic Energy Research Institute (jaeri)
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Cho Sung-hak
Electrotechnical Laboratory (etl)
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ITO Masanori
Department of Neurological Surgery, Juntendo University Urayasu Hospital
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伊藤 晴雄
千葉工業大学
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MATSUHATA Hirofumi
National Institute of Advanced Industrial Science and Technology
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HARASHIMA Hiroshi
Department of Physics,Division of Material Science,Nagoya University
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KAKURAI Kazuhisa
Japan Atomic Energy Agency
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TAKABATAKE Toshiro
Department of Quantum Matter,Graduate School of Advanced Science of Matter,Hiroshima University
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ITOH Hisayoshi
Japan Atomic Energy Research Institute
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Kondo Yasuyuki
Department of Gastroenterology, Kanto Medical Center NTT EC
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Kondo Y
Department Of Physics Division Of Material Science Nagoya University
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Murata K
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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Itoh H
Japan Atomic Energy Research Institute Takasaki Radiation Chemistry Research Establishment
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Itoh Hisayoshi
Japan Atomic Energy Agency
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OSAKABE Toyotaka
Advanced Science Research Center, Japan Atomic Energy Research Institute
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UMEO Kazunori
Department of Quamtam Matter, ADSM, Hiroshima University
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OHSHIMA Takeshi
Japan Atomic Energy Research Institute
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Murata K
Electrotechnical Laboratory
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Murata K
Department Of Material Science Graduate School Of Science Osaka City University
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Murata Keizo
Osaka City University
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IIKUBO Satoshi
Department of Physics, Division of Material Science, Nagoya University
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YASUl Yukio
Department of Physics,Division of Material Science,Nagoya University
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HARASHlNA Hiroshi
Department of Physics,Division of Material Science,Nagoya University
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YOSHII Shunsuke
CREST, Japan Science and Technology Corporation (JST)
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MURATA Kazuhiro
Department of Physics, Division of Material Science, Nagoya University
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Ito Masanori
Department Of Medicine And Molecular Science Hiroshima University Graduate School Of Biomedical Scie
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SHIMIZU Mitsuaki
Optoelectronic Division, Electrotechnical Laboratory
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MURATA Kazuhiro
Electrotechnical Laboratory
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Takabatake Toshiro
Department Of Quantum Matter Adsm Hiroshima University
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MOTOYA Kiyoichiro
Department of Metal Science and Technology,Kyoto University
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IIKUBO Satoshi
Quantum Beam Science Directorate, Japan Atomic Energy Agency
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YOSHII Shunsuke
KYOKUGEN, Osaka University
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SOTA Takayuki
Department of Electrical, Electronics, and Computer Engineering, Waseda University
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LEE Kin
Japan Atomic Energy Agency
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HARA Shinji
Advanced Industrial Science and Technology (AIST), Power Electronics Research Center
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CHO Dong-Hyun
Advanced Industrial Science and Technology (AIST), Power Electronics Research Center
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JEGANATHAN Kulandaivel
Advanced Industrial Science and Technology (AIST), Power Electronics Research Center
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SHEN Xu-Qiang
Advanced Industrial Science and Technology (AIST), Power Electronics Research Center
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OKUMURA Hajime
Advanced Industrial Science and Technology (AIST), Power Electronics Research Center
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OOKITA Hideyuki
Science University of Tokyo
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PIAO Guaxi
National Institute of Advanced Industrial Science and Technology
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YAMAMOTO Yuki
National Institute of Advanced Industrial Science and Technology
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HIKOSAKA Kazunori
National Institute of Advanced Industrial Science and Technology
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YAGI Shuichi
Advanced Industrial Science and Technology (AIST), Power Electronics Research Center
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INADA Masaki
Advanced Industrial Science and Technology (AIST), Power Electronics Research Center
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PIAO Guanxi
Advanced Industrial Science and Technology (AIST), Power Electronics Research Center
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OKUMURA Hajime
Tsukuba Laboratory, TAIYO NIPPON SANSO Corporation
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ARAI Kazuo
Tsukuba Laboratory, TAIYO NIPPON SANSO Corporation
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CHO Hyung-Koun
Department of Metallurgical Engineering, Dong-A University
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JEGANATHAN Kulandaivel
Power Electronics Research Center, National institute of Advanced industrial Science and Technology,
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SHEN Xu-Qiang
New Energy and Industrial Technology Development Organization (NEDO)
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IDE Toshihide
Course in Electrical Engineering, Department of Science and Technology, Graduated School of Meiji Un
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SUZUKI Akira
Course of Electronics, Graduate School of Engineering, Tokai University
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SHEN Xu-Qiang
Optoelectric Division, Electrotechnical Laboratory
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OKUMURA Hajime
Optoelectric Division, Electrotechnical Laboratory
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NEMOTO Toshio
Course in Electrical Engineering, Department of Science and Technology, Graduated School of Meiji Un
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Yoshii S
Osaka Univ. Osaka
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Yoshii Shunsuke
Physics Department Graduate School Of Science Tohoku University
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Yoshii Shunsuke
Crest Japan Science And Technology Corporation (jst)
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Yoshii Shunsuke
Crest Japan Science And Technology Corporation(jst)
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Osakabe Toyotaka
Advanced Science Research Center Japan Atomic Energy Research Institute
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Iikubo S
Quantum Beam Science Directorate Japan Atomic Energy Agency
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Iikubo Satoshi
Department Of Physics Division Of Material Science Nagoya University
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Matsuhata H
Toyota Technological Institute:(present Address)electrotechnical Laboratory
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Matsuhata Hirofumi
National Institute Of Advanced Industrial Science And Technology (aist) Central 2
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Murata Kazuhiro
Department Of Physics Division Of Material Science Nagoya University
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Murata K
Tokyo Medical And Dental Univ. Tokyo Jpn
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Motoya Kiyoichiro
Department Of Metal Science And Technology Kyoto University:institute For Solid State Physics Univer
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Sota T
Waseda Univ. Tokyo Jpn
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Sota Takayuki
Graduate School Of Science And Engineering Waseda University
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TAKIGAWA Shinichi
R&D Association of Future Electron Devices, c/o National Institute of Advanced Industrial Science an
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FURUTA Kei
R&D Association of Future Electron Devices, c/o National Institute of Advanced Industrial Science an
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SHIMIZU Saburo
R&D Association of Future Electron Devices, c/o National Institute of Advanced Industrial Science an
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KITAMURA Toshio
Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology
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Shen Xu-qiang
National Institute Of Advanced Industrial Science And Technology (aist) Central 2
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IWAMOTO Chihiro
Engineering Research Institute, The University of Tokyo
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JIKIMOTO Tamotsu
Central Research Institute of Electric Power Industry
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HIJIKATA Yasuto
Saitama University, Saitama-shi
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TSUCHIDA Hidekazu
Central Research Institute of Electric Power Industry
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YOSHIDA Sadafumi
Saitama University, Saitama-shi
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YOSHIDA Sadafumi
Department of Electrical and Electronic Systems, Saitama University
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Takahashi Teruo
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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Taguchi Tomohiro
Department Of Organic Materials Tokyo Institute Of Technology
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Harashima Hiroshi
Department Of Information And Communication Engineering School Of Engineering The University Of Toky
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Takahashi Toshiaki
Department Of Environment And Mutation Research Institute For Radiation Biology And Medicine Hiroshi
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Yoshida Sadafumi
Division Of Mathematics Electronics And Informatics Graduate School Of Science And Engineering Saita
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Yoshikawa Masahito
Japan Atomic Energy Research Institute
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KOJIMA Kazutoshi
National Institute of Advanced Industrial Science and Technology (AIST)
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TANAKA Yasunori
National Institute of Advanced Industrial Science and Technology (AIST)
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KAMIYA Tomihiro
Japan Atomic Energy Research Institute (JAERI)
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MATSUTANI Katsuhiro
Tokuyama Soda Co. Ltd.
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Sota Takayuki
Department Of Electric Electronics And Computer Engineering Waseda University
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Sota T
Graduate School Of Science And Engineering Waseda University
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Arai Kazuo
National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn
著作論文
- Static Correlation and Dynamical Properties of Tb^-moments in Tb_2Ti_2O_7 : Neutron Scattering Study
- Neutron Scattering Study of the Spin Correlation in the Spin Ice System Ho_2Ti_2O_7
- Neutron Diffraction Study of Pyrochlore Compound R_2Ru_2O_7 (R=Y, Nd) above and below the Spin Freezing Temperature : Condensed Matter: Electronic Properties, etc.
- Neutron Inelastic Scattering Study on a Single Crystal of Tb_2Ti_2O_7,a Magnetically Frustrated Pyrochlore System
- Improvement of DC Characteristics in AlGaN/GaN Heterojunction Field-Effect Transistors Employing AlN Spacer Layer
- AIN/AlGaN/GaN Metal Insulator Semiconductor Heterostructure Field Effect Transistor
- Effects of High-k Passivation Films on AlGaN/GaN HEMT
- p-type InGaN Cap Layer for Normally-off Operation in AlGaN/GaN HFETs
- High breakdown voltage AlGaN/GaN metal-insulator-semiconductor high-electron-mobility transistor with TiO2/SiN gate insulator (Special issue: Solid state devices and materials)
- High Breakdown Voltage AlGaN/GaN MIS-HEMT with TiO_2/Si_3N_4 Gate Insulator
- High Speed AlGaN/GaN MIS-HEMT with High Drain and Gate Breakdown Voltages
- GaN Crystal Growth on Sapphire Substrate Using Islandlike GaN Buffer Formed by Repetition of Thin-Layer Low-Temperature Deposition and Annealing in rf-Plasma Molecular Beam Epitaxy
- Improvement of GaN Crystal Quality in RF-MBE Using Thin Low-Temperature-Grown GaN Buffer Layers
- Impact of Vicinal Sapphire (0001) Substrates on the High-Quality AIN Films by Plasma-Assisted Molecular Beam Epitaxy
- Gate-Length Dependence of DC Characteristics in Submicron-Gate AlGaN/GaN HEMTs
- Roles of Si Irradiation during the Growth Interruption on GaN Film Qualities in Plasma-Assisted Molecular Beam Epitaxy : Semiconductors
- Indium Roles on the GaN Surface Studied Directly by Reflection High-Energy Electron Diffraction Observations : Semiconductors
- High-Quality GaN Layers on c-Plane Sapphire Substrates by Plasma-Assisted Molecular-Beam Epitaxy Using Double-Step AlN Buffer Process
- Temperature Characteristics AlGaN/GaN Heterojunction Field Effect Transistors
- Advantages of AlN/GaN Metal Insulator Semiconductor Field Effect Transistor using Wet Chemical Etching With Hot Phosphoric Acid : Semiconductors
- Optimization of GaN Growth with Ga-Polarity by Referring to Surface Reconstruction Reflection High-Energy Electron Diffraction Patterns : Semiconductors
- High-Quality InGaN Films Grown on Ga-Polarity GaN by Plasma-Assisted Molecular-Beam Epitaxy
- AlGaN/GaN Heterojunction High Electron Mobility Transistors Using Ga-Polarity Crystal Growth by Plasma-Assisted Molecular Beam Epitaxy
- Essential Change in Crystal Qualities of GaN Films by Controlling Lattice Polarity in Molecular Beam Epitaxy
- Growth of Droplet-Free AlGaN Buffer Layer with +c Polarity by Molecular Beam Epitaxy
- Characterization of Polarity of Wurtzite GaN Film Grown by Molecular Beam Epitaxy Using NH_3
- Electrical Characteristics of Interface Defects in Oxides Grown at 1200℃ in Dry Oxygen Ambient on Silicon Carbide and Their
- The Electrical Characteristics of Metal-Oxide-Semiconductor Field Effect Transistors Fabricated on Cubic Silicon Carbide
- Characterization of Polarity of Plasma-Assisted Molecular Beam Epitaxial GaN{0001}Film Using Coaxial Impact Collision Ion Scattering Spectroscopy
- Computer Simulation for Analysis of Lattice Polarity of Wurtzite GaN{0001} Film by Coaxial Impact Collision Ion Scattering Spectroscopy
- Incommensurate Magnetic Structure of the Heavy Fermion Antiferromagnet Ce_7Ni_3 : Condensed Matter: Electronic Properties, etc.
- In situ Observation of Clusters in Gas Phase during 4H-SiC Epitaxial Growth by Chemical Vapor Deposition Method
- Chemical Bonding Properties of Cubic III-Nitride Semiconductors
- Structure Analysis of GaN Thin Film with Inversion Domains by High Voltage Atomic Resolution Microscopy