In situ Observation of Clusters in Gas Phase during 4H-SiC Epitaxial Growth by Chemical Vapor Deposition Method
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-08-15
著者
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Ishida Y
Kitakyushu Foundation For The Advancement Of Ind. Sci. And Technol. Kitakyushu Jpn
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OKUMURA Hajime
National Institute of Advance Industrial Science and Technology (AIST), Power Electronics Research C
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ARAI Kazuo
National Institute of Advanced Industrial Science and Technology
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Okumura H
Neutron Scattering Laboratory Issp The University Of Tokyo
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ISHIDA Yuuki
National Institute of Advanced Industrial Science and Technology
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TAKAHASHI Tetsuo
National Institute of Advanced Industrial Science and Technology
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YOSHIDA Sadafumi
Department of Electrical and Electronic Systems, Saitama University
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Takahashi Tetsuo
National Institute Of Advanced Industrial Science And Technology Power Electronics Research Center
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Takahashi T
Japan Advanced Institute Of Science And Technology
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