SHIMIZU Saburo | ULVAC JAPAN, Ltd
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概要
関連著者
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SHIMIZU Saburo
ULVAC JAPAN, Ltd
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Shimizu Saburo
Ulvac Corporation
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Shimizu S
R&d Association Of Future Electron Devices C/o National Institute Of Advanced Industrial Science
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SONODA Saki
ULVAC JAPAN, Ltd,
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Sonoda Saki
Ulvac Inc.
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OKUMURA Hajime
Electrotechnical Laboratory (ETL)
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Okumura H
National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn
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Okumura H
Electrotechnical Lab. Ibaraki Jpn
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Okumura H
Neutron Scattering Laboratory Issp The University Of Tokyo
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Okumura Hajime
Electrotechnical Laboratory
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Sonoda S
Lvac Inc.
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Okunuma H
National Institute Of Advanced Industrial Science And Technology
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Shimizu M
Advanced Industrial Science And Technology (aist) Power Electronics Research Center
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Shimizu Mitsuaki
Power Electronics Research Center National Institute Of Advanced Industrial Science And Technology
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Suzuki Y
Showa Shell Sekiyu K.k. Kanagawa
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Shimizu Masahiro
Ulsi Development Center Mitsubishi Electric Corporation
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Suzuki Y
Hitachi Ltd. Tokyo Jpn
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Hara S
Advanced Industrial Science And Technology (aist) Power Electronics Research Center:ultra-low-loss P
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Suzuki Y
Optoelectronic Division Electrotechnical Laboratory
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SHEN Xu-Qiang
Electrotechnical Laboratory (ETL)
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HARA Shiro
Electrotechnical Laboratory (ETL)
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Shen Xu-qiang
Power Electronics Research Center National Institute Of Advanced Industrial Science And Technology
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Shen X‐q
National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn
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SUZUKI Yoshifumi
NTT Electrical Communications Laboratories
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Suzuki Yoshiichi
Central Research And Development Laboratory Showa Shell Sekiyu K.k.
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Suzuki Yoshifumi
Department Of Materials Science Faculty Of Engineering Kyushu Institute Of Technology
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Suzuki Yoshishige
Joint Research Center For Atom Technology(jrcat)-national Institute For Advanced Interdisciplinary R
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Suzuki Yasuzou
Nanotechnology Research Institute National Institute Of Advanced Industrial Science And Technology
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SUZUKI Yasumasa
ULVAC JAPAN, Ltd.
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BALAKRISHNAN K.
静岡大
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Balakrishnan K.
静岡大学電子工学研究所
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Balakrishnan Krishnan
名城大学理工学部材料機能工学科
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Komiya S
Fujitsu Laboratories Ltd.
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Komiya Satoshi
Fujitsu Laboratories Lid.
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K バラクリシュナン
静岡大学電子工学研究所
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IDE Toshihide
Advanced Industrial Science and Technology (AIST), Power Electronics Research Center
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SHIMIZU Mitsuaki
Electrotechnical Laboratory (ETL)
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IDE Toshihide
Electrotechnical Laboratory (ETL)
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CHO Sung-Hwan
Electrotechnical Laboratory (ETL)
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SHIRAKASHI Jun-ichi
Electrical and Electronic System Engineering, Tokyo University of Agriculture and Technology
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YAMAKAWA Hiroyuki
ULVAC JAPAN, Lid.
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Komiya S
Fujitsu Lab. Ltd. Atsugi Jpn
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Balakrishnan Krishnan
Electrotechnical Laboratory
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Yamakawa Hiroyuki
Ulvac Corporation
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Cho Sung-hak
Electrotechnical Laboratory (etl)
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Makita Y
Marine Resources And Environment Institute National Institute Of Advanced Industrial Science And Tec
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Ide Toshihide
Advanced Industrial Science And Technology (aist) Power Electronics Research Center
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Shirakashi Junichi
Electrotechnical Laboratory
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NISHIHARA Takaharu
Shimadzu Corporation
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SHINOHARA Makoto
Shimadzu Corporation
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Nishihara T
Av Core Technology Development Center Matsushita Electric Industrial Co. Ltd.
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Shinohara M
Shimadzu Corporation
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TSUKAKOSHI Osamu
ULVAC Corporation, Hagisono
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KOMIYA Souji
ULVAC Corporation, Hagisono
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Shirakashi Jun-ichi
Electrotechnical Laboratory
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Nishihara Takashi
Optical Disk Systems Development Center Matsushita Electric Industrial Co. Ltd.
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Komiya Souji
Ulvac Corporation
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Tsukakoshi O
Ulvac Corporation Hagisono
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Tsukakoshi Osamu
Ulvac Corporation
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Makita Yoji
Marine Resources and Environment Institute, National Institute of Advanced Industrial Science and Technology (AIST)
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KATAYAMA Mitsuhiro
Department of Electronic Engineering, Graduate School of Engineering, Osaka University
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OURA Kenjiro
Department of Electronic Engineering, Graduate School of Engineering, Osaka University
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Oura K
Research Center For Ultrahigh Voltage Electron Microscopy Osaka University
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片山 光浩
Division Of Electrical Electronic And Information Engineering Graduate School Of Engineering Osaka U
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Katayama Mitsuhiro
Osaka Univ. Osaka Jpn
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Katayama Mitsuhiro
Department Of Electronic Engineering Graduate School Of Engineering Osaka University
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Fukuhara Junji
Ulvac Japan Lid.
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Hayashi Shinji
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kobe University
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MAKITA Yunosuke
Electrotechnical Laboratory
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Hayashi S
Department Of Electrical And Electronics Engineering Faculty Of Engineering Kobe University
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HAYASHI Toshio
ULVAC Japan Co., Ltd.
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FUJINO Toshiaki
Department of Electronic Engineering, Graduate School of Engineering, Osaka University
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Yamakawa Hiroyuki
Ulvac Japan Lid.
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Hayashi Shigenori
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Hayashi Shigenori
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
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Hayashi Shigenori
Faculty Of Engineering Osaka University
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Seki Seiji
Ulvac Japan Ltd.
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Fuse T
Department Of Electronic Engineering Graduate School Of Engineering Osaka University
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Shimizu Saburo
Ulvac Inc.
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Shimizu Saburo
Ulvac Japan Ltd.
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Shimizu Saburo
Ulvac Japan Lid.
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HAYASHI Shigeki
Shimadzu Corporation
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Fujino Takahiro
Research Institute For Advanced Science And Technology Osaka Prefecture University
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OKUNO Tomohisa
Department of Electronic Engineering, Graduate School of Engineering, Osaka University
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SHINDO Masato
Department of Electronic Engineering, Graduate School of Engineering, Osaka University
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MAKITA Yonosuke
Electrotechnical Laboratory
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SASAKI Naruyasu
ULVAC JAPAN, Ltd.
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GONOHE Narishi
ULVAC Corporation
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TAMAGAWA Kouichi
ULVAC Corporation
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Oura Kenjiro
Department Of Elecronic Engineering Graduate School Of Engineering Osaka University
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Gonohe N
Ulvac Inc. Susono Jpn
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Okuno T
Department Of Electronic Engineering Graduate School Of Engineering Osaka University
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Shindo Masato
Department Of Elecronic Engineering Graduate School Of Engineering Osaka University
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Shindo Masato
Department Of Electronic Engineering Graduate School Of Engineering Osaka University
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Sasaki Naruyasu
Ulvac Japan Ltd.
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Hayashi Toshio
Ulvac Corporation
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Cho Sung-Hwao
Electrotechnical Laboratory (ETL)
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Fujino Toshiaki
Department of Elecronic Engineering, Graduate School of Engineering, Osaka University
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Okuno Tomohisa
Department of Elecronic Engineering, Graduate School of Engineering, Osaka University
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Katayama Mitsuhiro
Department of Elecronic Engineering, Graduate School of Engineering, Osaka University
著作論文
- Optimization of GaN Growth with Ga-Polarity by Referring to Surface Reconstruction Reflection High-Energy Electron Diffraction Patterns : Semiconductors
- Essential Change in Crystal Qualities of GaN Films by Controlling Lattice Polarity in Molecular Beam Epitaxy
- Influence of Mn Incorporation on Molecular Beam Epitaxial Growth of GaMnN Film :Surfaces, Interfaces, and Films
- Characterization of Polarity of Wurtzite GaN Film Grown by Molecular Beam Epitaxy Using NH_3
- Selectively Doped n-InAlAs/InP Heterostructures Grown by MOCVD
- Characterization of Polarity of Plasma-Assisted Molecular Beam Epitaxial GaN{0001}Film Using Coaxial Impact Collision Ion Scattering Spectroscopy
- Computer Simulation for Analysis of Lattice Polarity of Wurtzite GaN{0001} Film by Coaxial Impact Collision Ion Scattering Spectroscopy
- Terminating Structure of Plasma-Assisted Molecular Beam Epitaxial GaN{0001} Film Surface Identified by Coaxial Impact Collision Ion Scattering Spectroscopy
- A Molecular and Jon-Beam Epitaxy System for the Growth of III-V Compound Semiconductors Using a Mass-Separated, Low-Energy Group-V Jon Beam
- Molecular Beam Epitaxy of InP Using Low Energy P^+ Ion Beam
- Epitaxial Growth of α-Fe Film on Si(111) Substrate by Low-Energy Direct Ion Beam Deposition
- Low-Temperature Silicon Epitaxial Growth by Photochemical Vapor Deposition Using Vacuum Ultraviolet Light