Characterization of Polarity of Plasma-Assisted Molecular Beam Epitaxial GaN{0001}Film Using Coaxial Impact Collision Ion Scattering Spectroscopy
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-02-01
著者
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Suzuki Y
Showa Shell Sekiyu K.k. Kanagawa
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BALAKRISHNAN K.
静岡大
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Balakrishnan K.
静岡大学電子工学研究所
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Balakrishnan Krishnan
名城大学理工学部材料機能工学科
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Suzuki Y
Hitachi Ltd. Tokyo Jpn
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Suzuki Y
Optoelectronic Division Electrotechnical Laboratory
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K バラクリシュナン
静岡大学電子工学研究所
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OKUMURA Hajime
Electrotechnical Laboratory (ETL)
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SONODA Saki
ULVAC JAPAN, Ltd,
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SHIMIZU Saburo
ULVAC JAPAN, Ltd
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SHIRAKASHI Jun-ichi
Electrical and Electronic System Engineering, Tokyo University of Agriculture and Technology
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Okumura H
National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn
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Okumura H
Electrotechnical Lab. Ibaraki Jpn
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Okumura H
Neutron Scattering Laboratory Issp The University Of Tokyo
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Okumura Hajime
Electrotechnical Laboratory
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Balakrishnan Krishnan
Electrotechnical Laboratory
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SUZUKI Yoshifumi
NTT Electrical Communications Laboratories
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Suzuki Yoshiichi
Central Research And Development Laboratory Showa Shell Sekiyu K.k.
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Suzuki Yoshifumi
Department Of Materials Science Faculty Of Engineering Kyushu Institute Of Technology
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Suzuki Yoshishige
Joint Research Center For Atom Technology(jrcat)-national Institute For Advanced Interdisciplinary R
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Suzuki Yasuzou
Nanotechnology Research Institute National Institute Of Advanced Industrial Science And Technology
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Sonoda S
Lvac Inc.
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Sonoda Saki
Ulvac Inc.
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Okunuma H
National Institute Of Advanced Industrial Science And Technology
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Shimizu S
R&d Association Of Future Electron Devices C/o National Institute Of Advanced Industrial Science
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Shimizu Saburo
Ulvac Corporation
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Shirakashi Junichi
Electrotechnical Laboratory
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SUZUKI Yasumasa
ULVAC JAPAN, Ltd.
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Shirakashi Jun-ichi
Electrotechnical Laboratory
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