SiO_2/Si System Studied by Scanning Capacitance Microscopy

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概要

• 論文の詳細を見る

• The applicability of scanning capacitance microscopy (SCaM) in the characterization of SiO_2/Si systems was demonstrated. Our SCaM, which is combined with a contact AFM, measures the capacitance derivative against the bias voltage applied to the sample (dC/dV). Line-shaped grooves etched into a SiO_2 layer were imaged by SCaM based on the differences in the SiO_2 thickness. AFM images were simultaneously obtained. The acquired SCaM and AFM images showed good agreement. SCaM images of the sample were obtained at different dc bias voltages. The contrasts of the SCaM images varied with the dc bias. The bias dependence of the image contrasts was compared with the dC/dV-V differences between the thick SiO_2 regions and the thin SiO_2 regions and with calculated results. The results of this comparison showed good agreement.

• 社団法人応用物理学会の論文
• 1996-06-30

著者

• Suzuki Y

  Showa Shell Sekiyu K.k. Kanagawa

• Suzuki Y

  Hitachi Ltd. Tokyo Jpn

• Suzuki Y

  Optoelectronic Division Electrotechnical Laboratory

• SUZUKI Yoshifumi

  NTT Electrical Communications Laboratories

• Suzuki Yoshiichi

  Central Research And Development Laboratory Showa Shell Sekiyu K.k.

• Suzuki Yoshifumi

  Department Of Materials Science Faculty Of Engineering Kyushu Institute Of Technology

• Yamamoto Takenori

  Deptarment Of Electrical And Electronic Engineering Toyohashi University Of Technology

• Suzuki Yoshishige

  Joint Research Center For Atom Technology(jrcat)-national Institute For Advanced Interdisciplinary R

• Yamamoto Tokujirou

  Department Of Materials Science And Engineering Kyoto University

• Suzuki Yasuzou

  Nanotechnology Research Institute National Institute Of Advanced Industrial Science And Technology

• Nakagiri N

  Core Technology Center Nikon Co.

• YAMAMOTO Takuma

  Tsukuba Research Lab., Nikon Co.

• SUGIMURA Hiroyuki

  Tsukuba Research Lab., Nikon Co.

• NAKAGIRI Nobuyuki

  Tsukuba Research Lab., Nikon Co.

• SUZUKI Yoshihiko

  Central Research Laboratory, Nikon Corporation

• Sugimura H

  Department Of Materials Processing And Engineering Graduate School Of Engineering Nagoya University

• Suzuki Yoshihiko

  Central Research Laboratory Nikon Corporation

• Yamamoto Takayoshi

  The Institute Of Scientific And Industrial Research Osaka University

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