Preparation of High-T_c Y-Ba-Cu-O Films by Three-Target Magnetron Sputtering
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1990-04-20
著者
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Tanaka Yasuaki
Ntt Interdisciplinary Research Laboratories
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Tanaka Y
Tokyo Univ. Agriculture And Technol. Koganei Jpn
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MAEDA Hiroshi
National Research Institute for Metals, Sengen
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Maeda H
National Research Inst. Metals Ibaraki
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Maeda H
National Research Institute For Metals Tsukuba Laboratories
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TANAKA Yoshiaki
National Research Insitute for Metals, Tsukuba Laboratories
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ASANO Toshihisa
National Research Insitute for Metals, Tsukuba Laboratories
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FUKUTOMI Masao
National Research Insitute for Metals, Tsukuba Laboratories
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AKUTSU Nakao
Corporate R&D Center, Mitsui Mining & Smelting Co., Ltd.
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KATOH Kazuhiko
Corporate R&D Center, Mitsui Mining & Smelting Co., Ltd.
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TAKAHARA Hidefusa
Corporate R&D Center, Mitsui Mining & Smelting Co., Ltd.
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Yamamoto Takenori
Deptarment Of Electrical And Electronic Engineering Toyohashi University Of Technology
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Yamamoto Tokujirou
Department Of Materials Science And Engineering Kyoto University
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Akutsu Nakao
Corporate R&d Center Mitsui Mining & Smelting Co. Ltd.
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Fukutomi M
National Research Institute For Metals Tsukuba Laboratories
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Fukutomi Masao
Research Institute Of Agricultural Resources Ishikawa Agricultural College
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Katoh Kazuhiko
Corporate R&d Center Mitsui Mining & Smelting Co. Lid.
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Katoh Kazuhiko
Corporate R&d Center Mitsui Mining & Smelting Co. Ltd.
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Takahara H
Mitsui Mining & Smelting Co. Ltd. Corporate R & D Center
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Asano Toshihisa
National Institute For Materials Science (nims)
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Takahara Hidefusa
Corporate R&d Center Mitsui-kinzoku
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Yamamoto Takayoshi
The Institute Of Scientific And Industrial Research Osaka University
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Tanaka Yoshiaki
National Institute Of Agrobiological Science
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Maeda Hiroshi
National Fisheries University
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