Annealing Behavior of Induced Anisotropy in Electrodeposited Polycrystalline Nickel Films

概要

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The annealing behavior of electrodeposited nickel films, that is, the annealing decay of the magnetostrictively induced uniaxial anisotropy was investigated after deposition and after stabilization at 70℃ when the films were annealed isothermally in a magnetic field parallel to the magnetic hard axis. The fractional anisotropy of P=(Ku(t)-Ku(∞))/(Ku(0)-Ku(∞)) can be expressed as a function of annealing time t in a form of P=exp(-t/τ)^<1/3> in all as-deposited and stabilized films, where τ is a relaxation time. Such one-third power dependence can be well explained by such a model that defects annihilate into grain boundaries, and this model also explains a stabilizing effect. The activation energy of 1.1_5 eV for the stabilized films is in good agreement with that of stage III due to interstitial atoms in bulk nickel data. In a case of as-deposited films the lowing of the activation energy to 0.7_4 eV may partially depend on an annihilation of divacancies.
社団法人日本物理学会の論文
1972-01-05